Ion source scaling laws

Pramana ◽  
1982 ◽  
Vol 19 (3) ◽  
pp. 279-288
Author(s):  
R Jones
1988 ◽  
Vol 37 (4) ◽  
pp. 1121-1132 ◽  
Author(s):  
J. H. M. Bonnie ◽  
P. J. Eenshuistra ◽  
H. J. Hopman

1989 ◽  
Vol 50 (C1) ◽  
pp. C1-751-C1-758 ◽  
Author(s):  
W. HALVERSON ◽  
Y. K. PU ◽  
L. BROMBERG ◽  
D. COHN ◽  
C. PETTY ◽  
...  

1998 ◽  
Vol 69 (2) ◽  
pp. 1100-1102 ◽  
Author(s):  
A. Girard ◽  
C. Perret ◽  
G. Melin ◽  
C. Lécot

1987 ◽  
Author(s):  
A. F. Lietzke ◽  
C. A. Hauck
Keyword(s):  

2017 ◽  
Vol 107 (5) ◽  
pp. 2225-2246 ◽  
Author(s):  
Kiran Kumar S. Thingbaijam ◽  
P. Martin Mai ◽  
Katsuichiro Goda

1994 ◽  
Vol 144 ◽  
pp. 185-187
Author(s):  
S. Orlando ◽  
G. Peres ◽  
S. Serio

AbstractWe have developed a detailed siphon flow model for coronal loops. We find scaling laws relating the characteristic parameters of the loop, explore systematically the space of solutions and show that supersonic flows are impossible for realistic values of heat flux at the base of the upflowing leg.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.


1993 ◽  
Vol 3 (10) ◽  
pp. 2041-2062 ◽  
Author(s):  
M. J. Thill ◽  
H. J. Hilhorst

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