The angular distribution of secondary particles in high energy nuclear collisions with heavy nuclei of photographic emulsion

1960 ◽  
Vol 15 (1) ◽  
pp. 18-24 ◽  
Author(s):  
J. Bartke ◽  
P. Ciok ◽  
J. Gierula ◽  
R. Hołyński ◽  
M. Mięsowicz ◽  
...  
Keyword(s):  
Angular Distribution ◽  
High Energy ◽  
Photographic Emulsion ◽  
Heavy Nuclei ◽  
Nuclear Collisions ◽  
Secondary Particles

Moments of the Angular Distribution for High Energy Nuclear Collisions

1952 ◽  
Vol 87 (5) ◽  
pp. 748-749 ◽  
Author(s):  
B. A. Chartres ◽  
H. Messel
Keyword(s):  
Angular Distribution ◽  
High Energy ◽  
Nuclear Collisions

On partitions of bipartite numbers

1953 ◽  
Vol 49 (1) ◽  
pp. 72-83 ◽  
Author(s):  
F. C. Auluck
Keyword(s):  
Angular Momentum ◽  
Angular Distribution ◽  
High Energy ◽  
Fixed Number ◽  
Conservation Of Energy ◽  
Nuclear Collisions ◽  
Thermodynamical Properties ◽  
Asymptotic Expressions ◽  
Two Parameters ◽  
Number Of Particles

1. In statistical mechanics, we usually deal with assemblies containing a fixed number of particles in which energy is the only conserved quantity. Recently, Fermi (1) has shown that the angular distribution of the pions produced in high-energy nuclear collisions can be explained if one takes into account the conservation of angular momentum in addition to the conservation of energy. We are, therefore, led to discuss the thermodynamical properties of assemblies characterized by the conservation of two or more parameters. The simplest assumption of this type that we can make is that there are two parameters, say E and P, which are conserved, and that each particle of the assembly can occupy the levels (r, s) (r, s are non-negative integers), where the contribution of the level (r, s) to E is rε0 and to P is sη0. In order to find the entropy, and hence other thermodynamical properties of the system, we have to enumerate the distinct number of ways, p(m, n), in which an assembly of particles corresponding to given values of E = mε0 and P = nη0 can be realized. In this paper we find asymptotic expressions for p(m, n) in the following cases: (a) m is a fixed number, (b) m and n are of the same order. It is assumed here that the number of particles is greater than m and n. We deal with the case (a) in §2 and the case (b) in §4. §3 deals with the asymptotic expansions of the generating function for p(m, n) which are used in §4.

On the angular distribution of secondary particles of high energy jet showers

1957 ◽  
Vol 6 (4) ◽  
pp. 979-981 ◽  
Author(s):  
S. Hasegawa ◽  
J. Nishimura ◽  
Y. Nishimura
Keyword(s):  
Angular Distribution ◽  
High Energy ◽  
Secondary Particles

The production of ז-mesons

1954 ◽  
Vol 221 (1146) ◽  
pp. 389-390
Keyword(s):  
Cosmic Radiation ◽  
High Probability ◽  
Nucleon Nucleon ◽  
High Energy ◽  
Energetic Particles ◽  
Photographic Emulsion ◽  
Heavy Nuclei

In 1950, Harding found two ז-mesons in plates exposed to the cosmic radiation at a depth of about 3 m in the ice on the Jungfraujoch plateau. At that time the only other ז-meson that had been reported was that found by the Bristol group (Brown, Camerini, Fowler, Muirhead, Powell & Ritson 1949) in a much greater volume of photographic emulsion than had been examined by Harding (1950). This suggested that ז-mesons are emitted more frequently from hydrogen than from heavier elements when similar numbers of energetic particles are incident upon them (Hodgson 1951). The ז-mesons are presumably produced in high-energy nucleon-nucleon collisions, and when this happens inside heavy nuclei there may be a high probability that the meson is absorbed before it can escape.

Analysis of electron-diffraction intensity profiles using a photodiode-array detection system

1983 ◽  
Vol 41 ◽  
pp. 322-323
Author(s):  
J. B. Warren
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Detection System ◽  
High Energy ◽  
Photographic Emulsion ◽  
Diffraction Intensity ◽  
Silicon Photodiode ◽  
Photodiode Array Detection ◽  
Analog To Digital ◽  
Photodiode Array

Electron diffraction intensity profiles have been used extensively in studies of polycrystalline and amorphous thin films. In previous work, diffraction intensity profiles were quantitized either by mechanically scanning the photographic emulsion with a densitometer or by using deflection coils to scan the diffraction pattern over a stationary detector. Such methods tend to be slow, and the intensities must still be converted from analog to digital form for quantitative analysis. The Instrumentation Division at Brookhaven has designed and constructed a electron diffractometer, based on a silicon photodiode array, that overcomes these disadvantages. The instrument is compact (Fig. 1), can be used with any unmodified electron microscope, and acquires the data in a form immediately accessible by microcomputer.Major components include a RETICON 1024 element photodiode array for the de tector, an Analog Devices MAS-1202 analog digital converter and a Digital Equipment LSI 11/2 microcomputer. The photodiode array cannot detect high energy electrons without damage so an f/1.4 lens is used to focus the phosphor screen image of the diffraction pattern on to the photodiode array.

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