Elastic scattering of electrons by hydrogen molecules

Pramana ◽  
1980 ◽  
Vol 14 (3) ◽  
pp. 201-208 ◽  
Author(s):  
B L Jhanwar ◽  
S P Khare ◽  
M K Sharma
1982 ◽  
Vol 26 (3) ◽  
pp. 1392-1400 ◽  
Author(s):  
B. L. Jhanwar ◽  
S. P. Khare ◽  
M. K. Sharma

1971 ◽  
Vol 49 (1) ◽  
pp. 13-19 ◽  
Author(s):  
J. G. Lodge ◽  
J. W. Darewych ◽  
R. P. McEachran

Elastic positron–hydrogen molecule collisions are considered below the first electronic excitation threshold. The interaction of the incoming positron with the hydrogen molecule is represented by a superposition of single center static and nonspherical polarization potentials. The static potential is expanded to second degree in Legendre polynomials. The Chebyshev polynomials are used to improve the truncated Legendre series approximation and the effect of including the fourth degree contribution is shown to be slight. Positronium formation effects are neglected. Two semiphenomenological polarization potentials are used, and it is shown that the parameters can be suitably adjusted to reproduce the results obtained if the Henry and Lane polarization potential is used. It is shown that the partial Ramsauer–Townsend effect is useful in determining the values of polarization potential parameters. Total elastic scattering cross sections are given for incoming positron energies between about 0.4 and 14 eV while the positron annihilation coefficient is given to about 60 eV.


1973 ◽  
Vol 51 (7) ◽  
pp. 779-779 ◽  
Author(s):  
J. G. Lodge ◽  
J. W. Darewych ◽  
R. P. McEachran

Author(s):  
J. Langmore ◽  
M. Isaacson ◽  
J. Wall ◽  
A. V. Crewe

High resolution dark field microscopy is becoming an important tool for the investigation of unstained and specifically stained biological molecules. Of primary consideration to the microscopist is the interpretation of image Intensities and the effects of radiation damage to the specimen. Ignoring inelastic scattering, the image intensity is directly related to the collected elastic scattering cross section, σɳ, which is the product of the total elastic cross section, σ and the eficiency of the microscope system at imaging these electrons, η. The number of potentially bond damaging events resulting from the beam exposure required to reduce the effect of quantum noise in the image to a given level is proportional to 1/η. We wish to compare η in three dark field systems.


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