Growth of GaAs1−xPx/GaAs and InAsxP1−x/InP strained quantum wells for optoelectronic devices by gas-source molecular beam epitaxy
1992 ◽
Vol 21
(2)
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pp. 137-141
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1996 ◽
Vol 165
(3)
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pp. 210-214
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2008 ◽
Vol 25
(2)
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pp. 726-729
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1992 ◽
Vol 120
(1-4)
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pp. 167-171
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2003 ◽
Vol 32
(4)
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pp. 244-248
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1996 ◽
Vol 158
(1-2)
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pp. 6-14
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1993 ◽
Vol 127
(1-4)
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pp. 241-245
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1988 ◽
Vol 12
(5)
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pp. 279-287
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