Materials characteristics of pseudomorphic high electron mobility transistor structures with InxGa1−xas single quantum well and GaAs-InxGa1−xas (0.25 < x < 0.4) thin strained superlattice active layers
1990 ◽
Vol 19
(6)
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pp. 509-513
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1985 ◽
Vol 32
(11)
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pp. 2546-2546
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1996 ◽
Vol 2
(3)
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pp. 205-218
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Keyword(s):
Keyword(s):