High-temperature oxidation of Ti3Al-based titanium aluminides in oxygen

1996 ◽  
Vol 27 (12) ◽  
pp. 3993-4002 ◽  
Author(s):  
T. K. Roy ◽  
R. Balasubramaniam ◽  
A. Ghosh
2010 ◽  
Vol 638-642 ◽  
pp. 1374-1378 ◽  
Author(s):  
Patrick J. Masset ◽  
Rossen Yankov ◽  
Andreas Kolitsch ◽  
Michael Schütze

Surfaces of titanium aluminides were treated by fluorine either physically using Plasma Immersion Ion Implantation (PI³) or chemically with a F-based polymer. By controlling the fluorination parameters, both treatments improve the oxidation resistance even in the presence of sulfur dioxide (0.1 vol%). No sulfur was detected in the oxide scale although thermodynamic calculations predict the formation of sulfides. The inward diffusion of oxygen and nitrogen in the alloy was found to be reduced in the presence of SO2.


2014 ◽  
Vol 783-786 ◽  
pp. 1117-1122
Author(s):  
Alexander Donchev ◽  
M. Galetz ◽  
M. Schütze

Intermetallic light weight TiAl-alloys are expected to replace the heavy Ni-based super alloys in several high temperature applications. However until now they cannot be used at temperatures above 700°C for longer times due to their insufficient oxidation resistance. The high temperature oxidation behavior can be improved drastically for the use at temperatures up to at least 1050°C by small amounts of fluorine in the surface region of TiAl-components. A thin protective alumina layer is formed after an optimized fluorine treatment during exposure in oxidizing high temperature environments. Results of isothermal and thermocyclic high temperature oxidation tests of untreated and halogen treated TiAl-samples of new types of TiAl-alloys containing Mo, Cu and Si will be presented in this paper. These results will be compared and discussed considering the beneficial effect of fluorine for a later use as e.g. turbine blades in jet engines. Key words: Titanium aluminides, high temperature oxidation, halogen effect,


2003 ◽  
Vol 100 (1) ◽  
pp. 73-82
Author(s):  
Y. Riquier ◽  
D. Lassance ◽  
I. Li ◽  
J. M. Detry ◽  
A. Hildenbrand

2013 ◽  
Vol 51 (10) ◽  
pp. 743-751 ◽  
Author(s):  
Seon-Hui Lim ◽  
Jae-Sung Oh ◽  
Young-Min Kong ◽  
Byung-Kee Kim ◽  
Man-Ho Park ◽  
...  

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