The density of states in the mobility gap of amorphous-silicon films computed by a new analytical method

1988 ◽  
Vol 10 (3) ◽  
pp. 237-246
Author(s):  
V. Augelli ◽  
R. Murri ◽  
L. Schiavulli
1997 ◽  
Vol 467 ◽  
Author(s):  
A. J. Franz ◽  
W. B. Jackson ◽  
J. L. Gland

ABSTRACTHydrogen plays an important role in the electronic behavior, structure and stability of amorphous silicon films. Therefore, determination of the hydrogen density of states (DOS) and correlation of the hydrogen DOS with the electronic film properties are important research goals. We have developed a novel method for determination of hydrogen DOS in silicon films, based on fractional evolution experiments. Fractional evolution experiments are performed by subjecting a silicon film to a series of linear, alternating heating and cooling ramps, while monitoring the hydrogen evolution rate. The fractional evolution data can be analyzed using two complementary memods, the fixed frequency factor approach and Arrhenius analysis. Using a rigorous, mean-field evolution model, we demonstrate the applicability of the two approaches to obtaining the hydrogen DOS in silicon films. We further validate both methods by analyzing experimental fractional evolution data foran amorphous silicon carbide film. Both types of analysis yield a similar double peaked density of states for the a-Si:C:H:D film.


1987 ◽  
Vol 90 (1-3) ◽  
pp. 123-126 ◽  
Author(s):  
V. Augelli ◽  
V. Berardi ◽  
R. Murri ◽  
L. Schiavulli

1989 ◽  
Vol 11 (6) ◽  
pp. 827-837
Author(s):  
V. Augelli ◽  
R. Murri ◽  
L. Schiavulli

1987 ◽  
Vol 35 (8) ◽  
pp. 4141-4144 ◽  
Author(s):  
C. E. Michelson ◽  
A. V. Gelatos ◽  
J. D. Cohen ◽  
J. P. Harbison

1975 ◽  
Vol 72 (2) ◽  
pp. 761-770 ◽  
Author(s):  
M. H. Brodsky ◽  
G. H. Döhler ◽  
P. J. Steinhardt

1981 ◽  
Vol 42 (C4) ◽  
pp. C4-779-C4-782 ◽  
Author(s):  
F. J. Demond ◽  
G. Müller ◽  
H. Damjantschitsch ◽  
H. Mannsperger ◽  
S. Kalbitzer ◽  
...  

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