Strain measurement by the reflection-moiré method

1971 ◽  
Vol 11 (2) ◽  
pp. 86-86 ◽  
Author(s):  
M. S. Gregory ◽  
A. W. Christian ◽  
I. F. Jones
1970 ◽  
Vol 5 (3) ◽  
pp. 162-168 ◽  
Author(s):  
A Luxmoore ◽  
R Hermann

Some commercial photoresists have been examined to assess their suitability for use with the moiré method of surface-strain measurement. As most of these materials do not produce a pattern of high contrast directly, some etching and plating procedures are also described. Combined with correct illumination, these processes will produce grids of sufficient contrast for most applications.


1984 ◽  
Vol 27 (233) ◽  
pp. 2347-2352 ◽  
Author(s):  
Yoshiharu MORIMOTO ◽  
Takuo HAYASHI ◽  
Noriyuki YAMAGUCHI

2009 ◽  
Vol 50 (2) ◽  
pp. 239-244 ◽  
Author(s):  
X. Xiao ◽  
Y. Kang ◽  
Z. Hou ◽  
W. Qiu ◽  
X. Li ◽  
...  

2017 ◽  
Vol 2017 (0) ◽  
pp. J0330302
Author(s):  
Masaaki KOGANEMARU ◽  
Koki MATSUMOTO ◽  
Masakazu UCHINO ◽  
Toru IKEDA

2007 ◽  
Author(s):  
Chi Seng Ng ◽  
Kok Yau Chua ◽  
Meng Tong Ong ◽  
Yoke Chin Goh ◽  
Anand K. Asundi

2009 ◽  
Author(s):  
Kosuke Shimo ◽  
Motoharu Fujigaki ◽  
Akihiro Masaya ◽  
Yoshiharu Morimoto

1968 ◽  
Vol 3 (2) ◽  
pp. 90-95 ◽  
Author(s):  
B Košťáuk

A simple theoretical treatment of moiré patterns is given with the use of relations between diagonal systems that have the physical meaning of contour lines of the functions in question. The general approach and knowledge of diagonal-system properties can simplify various problems of strain measurement by the moiré method, and this is demonstrated by the compensation of a moiré pattern and by the method of two-dimensional strain measurement.


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