A positron annihilation study on phase transitions in trans-stilbene single crystal

1995 ◽  
Vol 200 (3) ◽  
pp. 265-275 ◽  
Author(s):  
M. Bokor ◽  
T. Marek ◽  
K. Süvegh ◽  
I. Konkoly Theqe ◽  
A. Vértes
2011 ◽  
Vol 262 ◽  
pp. 012059 ◽  
Author(s):  
C K To ◽  
B Yang ◽  
C D Beling ◽  
S Fung ◽  
C C Ling ◽  
...  

1976 ◽  
Vol 10 (1) ◽  
pp. 85-90 ◽  
Author(s):  
K. Petersen ◽  
N. Thrane ◽  
G. Trumpy ◽  
R. W. Hendricks

1994 ◽  
Vol 49 (4) ◽  
pp. 2821-2824 ◽  
Author(s):  
P. C. Jain ◽  
S. K. Lee ◽  
N. Hozhabri ◽  
S. C. Sharma

2005 ◽  
Vol 412 (4-6) ◽  
pp. 327-330 ◽  
Author(s):  
Krishnan Sivaji ◽  
Arjunan Arulchakkaravarthi ◽  
Sellaiyan Selvakumar ◽  
Perumalsamy Ramasamy ◽  
Sambasivam Sankar ◽  
...  

2015 ◽  
Author(s):  
Pavel Kuznetsov ◽  
Jacub Cizek ◽  
Petr Hruska ◽  
Wolfgang Anwad ◽  
Yuri Bordulev ◽  
...  

1985 ◽  
Vol 52 (4) ◽  
pp. 431-439 ◽  
Author(s):  
P. C. Rice-evans ◽  
M. Moussavi-madani ◽  
F. A. R. El Khangi ◽  
K. U. Rao

2021 ◽  
pp. 2000631
Author(s):  
Zihao Wang ◽  
Xiumei Dong ◽  
Zhiyuan Chen ◽  
Houhua Xiong ◽  
Jie Gao ◽  
...  

2020 ◽  
Vol 153 (22) ◽  
pp. 224202
Author(s):  
Irena Jankowska-Sumara ◽  
Mariola Kądziołka-Gaweł ◽  
Maria Podgórna ◽  
Andrzej Majchrowski ◽  
Krystian Roleder

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 429
Author(s):  
Tengyun Liu ◽  
Peiqi Ge ◽  
Wenbo Bi

Lower warp is required for the single crystal silicon wafers sawn by a fixed diamond wire saw with the thinness of a silicon wafer. The residual stress in the surface layer of the silicon wafer is the primary reason for warp, which is generated by the phase transitions, elastic-plastic deformation, and non-uniform distribution of thermal energy during wire sawing. In this paper, an experiment of multi-wire sawing single crystal silicon is carried out, and the Raman spectra technique is used to detect the phase transitions and residual stress in the surface layer of the silicon wafers. Three different wire speeds are used to study the effect of wire speed on phase transition and residual stress of the silicon wafers. The experimental results indicate that amorphous silicon is generated during resin bonded diamond wire sawing, of which the Raman peaks are at 178.9 cm−1 and 468.5 cm−1. The ratio of the amorphous silicon surface area and the surface area of a single crystal silicon, and the depth of amorphous silicon layer increases with the increasing of wire speed. This indicates that more amorphous silicon is generated. There is both compressive stress and tensile stress on the surface layer of the silicon wafer. The residual tensile stress is between 0 and 200 MPa, and the compressive stress is between 0 and 300 MPa for the experimental results of this paper. Moreover, the residual stress increases with the increase of wire speed, indicating more amorphous silicon generated as well.


Sign in / Sign up

Export Citation Format

Share Document