Fractographic features of the fatigue fracture of piezoelectric materials

A. N. Pilyankevich; V. A. Kuz'menko; G. S. Oleinik; G. G. Pisarenko; A. K. Gerikhanov

doi:10.1007/bf01523990

Fractographic features of the fatigue fracture of piezoelectric materials

Strength of Materials ◽

10.1007/bf01523990 ◽

1978 ◽

Vol 10 (5) ◽

pp. 530-534

Author(s):

A. N. Pilyankevich ◽

V. A. Kuz'menko ◽

G. S. Oleinik ◽

G. G. Pisarenko ◽

A. K. Gerikhanov

Keyword(s):

Fatigue Fracture ◽

Piezoelectric Materials ◽

Fractographic Features

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The Relationship between Fractographic Features and Fracture Mechanics Data on Fatigue Fracture(Minor Special Issue on Fracture Mechanics)

Journal of the Society of Mechanical Engineers ◽

10.1299/jsmemag.75.642_1118 ◽

1972 ◽

Vol 75 (642) ◽

pp. 1118-1126

Author(s):

Hajime NAKAZAWA ◽

Hideo KOBAYASHI

Keyword(s):

Fracture Mechanics ◽

Fatigue Fracture ◽

Special Issue ◽

Fractographic Features ◽

The Relationship

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Fractographic Features of the Fatigue Fracture of Nitinol Alloy

Materials Science ◽

10.1007/s11003-020-00370-9 ◽

2020 ◽

Vol 55 (5) ◽

pp. 774-779

Author(s):

V. P. Iasnii ◽

H. M. Nykyforchyn ◽

O. Z. Student ◽

L. M. Svirska

Keyword(s):

Fatigue Fracture ◽

Nitinol Alloy ◽

Fractographic Features

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Analysis of Sputtered Zinc Oxide Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s1431927600001781 ◽

1980 ◽

Vol 38 ◽

pp. 416-417

Author(s):

T. A. Emma ◽

M. P. Singh

Keyword(s):

Electron Microscopy ◽

Zinc Oxide ◽

Piezoelectric Materials ◽

Oxide Films ◽

Optical Quality ◽

Zno Films ◽

Rf Power ◽

X Ray Diffraction ◽

Sputtered Films ◽

Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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