The electronic structure of Rhodium: Angle-resolved studies of photoelectron and secondary electron emission

1989 ◽  
Vol 73 (4) ◽  
pp. 479-487 ◽  
Author(s):  
A. Goldmann ◽  
G. Rosina ◽  
E. Bertel ◽  
F. P. Netzer
Keyword(s):  
Electronic Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission

Characterization of electronic structure in dielectric materials by making use of the secondary electron emission

2013 ◽  
Vol 13 (2) ◽  
pp. 396-402 ◽  
Author(s):  
Han S. Uhm ◽  
Joon H. Choi ◽  
Guangsup Cho ◽  
Byoung J. Park ◽  
Ran J. Jung ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Dielectric Materials

Threshold Energy Effects in Secondary Electron Emission

1999 ◽  
Vol 5 (S2) ◽  
pp. 662-663
Author(s):  
A. Howie
Keyword(s):  
Electronic Structure ◽  
Work Function ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Threshold Energy ◽  
Physical Processes ◽  
Hot Carrier ◽  
Major Significance ◽  
Atomic And Electronic Structure

The work function ϕ, the bandgap Eg, the threshold energy level Et, for the inelastic scattering of excited electrons and the threshold energy transfer Ed for the onset of structural ionisation damage are clearly of major significance in various actively developing forms of hot carrier imaging. Two exciting examples here are the ability to image small and dynamic local changes in work function by PEEM and as well as mapping the variations in electronic structure between p and n-type regions of a semiconductor by SE imaging in the SEM. More recently still there have been indications that the SE signal in the ESEM might be sensitive to local changes in bandgap and suggestions that it might be even possible to image spatial variations in pH. It is increasingly clear that if these attractive opportunities are to be efficiently explored and developed, systematic and preferably quantitative observations are needed. Such work requires specimens whose atomic and electronic structure is either fully known beforehand or can be deduced from other signals available in a situation where the physical processes in the microscope are well understood.

Historical Introduction

1977 ◽  
Vol 35 ◽  
pp. 2-5
Author(s):  
R. D. Heidenreich
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
50Th Anniversary ◽  
Secondary Emission ◽  
Wave Nature ◽  
Nobel Prize In Physics ◽  
Primary Electrons ◽  
The U.S ◽  
Mutual Agreement

This program has been organized by the EMSA to commensurate the 50th anniversary of the experimental verification of the wave nature of the electron. Davisson and Germer in the U.S. and Thomson and Reid in Britian accomplished this at about the same time. Their findings were published in Nature in 1927 by mutual agreement since their independent efforts had led to the same conclusion at about the same time. In 1937 Davisson and Thomson shared the Nobel Prize in physics for demonstrating the wave nature of the electron deduced in 1924 by Louis de Broglie.The Davisson experiments (1921-1927) were concerned with the angular distribution of secondary electron emission from nickel surfaces produced by 150 volt primary electrons. The motivation was the effect of secondary emission on the characteristics of vacuum tubes but significant deviations from the results expected for a corpuscular electron led to a diffraction interpretation suggested by Elasser in 1925.

SEM and Auger microanalysis studies of Cu-Be dynode surfaces at each activation condition

1978 ◽  
Vol 36 (1) ◽  
pp. 524-525
Author(s):  
T. Koshikawa ◽  
Y. Fujii ◽  
E. Sugata ◽  
F. Kanematsu
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Life Time ◽  
Activation Process ◽  
Beam Diameter ◽  
Activation Temperature ◽  
Electron Multiplier ◽  
Activation Condition ◽  
Activation Conditions

The Cu-Be alloys are widely used as the electron multiplier dynodes after the adequate activation process. But the structures and compositions of the elements on the activated surfaces were not studied clearly. The Cu-Be alloys are heated in the oxygen atmosphere in the usual activation techniques. The activation conditions, e.g. temperature and O2 pressure, affect strongly the secondary electron yield and life time of dynodes.In the present paper, the activated Cu-Be dynode surfaces at each condition are investigated with Scanning Auger Microanalyzer (SAM) (primary beam diameter: 3μmϕ) and SEM. The commercial Cu-Be(2%) alloys were polished with Cr2O3 powder, rinsed in the distilled water and set in the vacuum furnance.Two typical activation condition, i.e. activation temperature 730°C and 810°C in 5x10-3 Torr O2 pressure were chosen since the formation mechanism of the BeO film on the Cu-Be alloys was guessed to be very different at each temperature from the results of the secondary electron emission measurements.

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

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