Morphology and structure of the oxide films formed on 0Kh16N15M3B steel in dissociating N2O4 at 1170?1370�K

1983 ◽  
Vol 54 (5) ◽  
pp. 336-339
Author(s):  
V. N. Vechkanov ◽  
A. N. Khodan ◽  
A. P. Zakharov ◽  
V. P. Isakov ◽  
A. A. Antonov ◽  
...  
2015 ◽  
Vol 17 (4) ◽  
pp. 2770-2777 ◽  
Author(s):  
Nataliya Tsud ◽  
Sofiia Bercha ◽  
Robert G. Acres ◽  
Mykhailo Vorokhta ◽  
Ivan Khalakhan ◽  
...  

The surfaces of cerium oxide films were modified by histidine adsorption in vacuum. It was shown that the morphology and structure of the oxide are decisive factors which define the adsorption geometry of the histidine adlayer.


1995 ◽  
Vol 142 (10) ◽  
pp. 3320-3322 ◽  
Author(s):  
Jan Halvor Nordlien ◽  
Sachiko Ono ◽  
Noburo Masuko ◽  
Kemal Nis¸ancioǦlu

1996 ◽  
Vol 143 (8) ◽  
pp. 2564-2572 ◽  
Author(s):  
Jan Halvor Nordlien ◽  
Kemal NişancioǦu ◽  
Sachiko Ono ◽  
Noburo Masuko

Author(s):  
R.A. Ploc

The optic axis of an electron microscope objective lens is usually assumed to be straight and co-linear with the mechanical center. No reason exists to assume such perfection and, indeed, simple reasoning suggests that it is a complicated curve. A current centered objective lens with a non-linear optic axis when used in conjunction with other lenses, leads to serious image errors if the nature of the specimen is such as to produce intense inelastic scattering.


Author(s):  
T. A. Emma ◽  
M. P. Singh

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.


2009 ◽  
Vol 129 (11) ◽  
pp. 1981-1984
Author(s):  
Yuki Ueno ◽  
Takanori Aoki ◽  
Akio Suzuki ◽  
Tatsuhiko Matsushita ◽  
Masahiro Okuda

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