Injecting the ion beam into the ?Ogra? magnetic mirror machine

1964 ◽  
Vol 14 (5) ◽  
pp. 462-468
Author(s):  
A. L. Bezbatchenko ◽  
V. V. Kuznetsov ◽  
N. P. Malakhov ◽  
N. N. Semashko
Keyword(s):  
Ion Beam ◽  
Magnetic Mirror ◽  
Mirror Machine

Injection of an ion beam into the magnetic mirror machine `OGRA'

1964 ◽  
Vol 6 (3) ◽  
pp. 301-310 ◽  
Author(s):  
A L Bezbatchenko ◽  
V V Kuznetsov ◽  
N P Malakhov ◽  
N N Semashko
Keyword(s):  
Ion Beam ◽  
Magnetic Mirror ◽  
Mirror Machine

Passage of a plasma burst through a magnetic mirror machine

1964 ◽  
Vol 14 (4) ◽  
pp. 359-363
Author(s):  
N. N. Brevnov ◽  
A. I. Matulis
Keyword(s):  
Magnetic Mirror ◽  
Mirror Machine

Stabilization of magnetic mirror machine using rotating magnetic field

2018 ◽  
Vol 84 (5) ◽  
Author(s):  
O. Seemann ◽  
I. Be’ery ◽  
A. Fisher
Keyword(s):  
Magnetic Field ◽  
Magnetic Fields ◽  
Field Strength ◽  
Magnetic Field Strength ◽  
Collisional Plasma ◽  
Rotating Magnetic Field ◽  
Magnetic Mirror ◽  
Low Density ◽  
Mirror Machine

An increase in symmetry is observed for a low density non-collisional plasma, in a simple magnetic mirror machine, due to the application of external oscillating magnetic fields of 1.5 MHz frequency. The increase in symmetry is attributed to an increase in stability of the flute mode and is dependent on the field’s polarization and trap magnetic field strength.

Synchrotron Radiation Measurements from a Plasma in a Magnetic Mirror Machine

1964 ◽  
Vol 7 (9) ◽  
pp. 1549 ◽  
Author(s):  
A. J. Lichtenberg ◽  
S. Sesnic ◽  
A. W. Trivelpiece ◽  
S. A. Colgate
Keyword(s):  
Synchrotron Radiation ◽  
Magnetic Mirror ◽  
Mirror Machine ◽  
Radiation Measurements

Direct Observations of the Epitaxial Growth of Sputtered Ag on Si

1973 ◽  
Vol 31 ◽  
pp. 122-123
Author(s):  
J. S. Maa ◽  
Thos. E. Hutchinson
Keyword(s):  
Epitaxial Growth ◽  
Film Growth ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Microscopy Technique ◽  
Direct Observations ◽  
In Situ Electron Microscopy ◽  
Beam Sputtering ◽  
The Subject

The growth of Ag films deposited on various substrate materials such as MoS2, mica, graphite, and MgO has been investigated extensively using the in situ electron microscopy technique. The three stages of film growth, namely, the nucleation, growth of islands followed by liquid-like coalescence have been observed in both the vacuum vapor deposited and ion beam sputtered thin films. The mechanisms of nucleation and growth of silver films formed by ion beam sputtering on the (111) plane of silicon comprise the subject of this paper. A novel mode of epitaxial growth is observed to that seen previously.The experimental arrangement for the present study is the same as previous experiments, and the preparation procedure for obtaining thin silicon substrate is presented in a separate paper.

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