Role of hydrogen in interface states parameters of Ni/n-Si (111) Schottky diodes: (c-v) studies

1991 ◽  
Vol 10 (10) ◽  
pp. 556-558 ◽  
Author(s):  
P. P. Sahay ◽  
M. Shamsuddin ◽  
R. S. Srivastava
2003 ◽  
Vol 47 (10) ◽  
pp. 1847-1854 ◽  
Author(s):  
Ş. Altındal ◽  
S. Karadeniz ◽  
N. Tuğluoğlu ◽  
A. Tataroğlu

2017 ◽  
Vol 121 (13) ◽  
pp. 135701 ◽  
Author(s):  
Anna Persano ◽  
Iolanda Pio ◽  
Vittorianna Tasco ◽  
Massimo Cuscunà ◽  
Adriana Passaseo ◽  
...  

2005 ◽  
Vol 483-485 ◽  
pp. 425-428 ◽  
Author(s):  
R.R Ciechonski ◽  
Samuele Porro ◽  
Mikael Syväjärvi ◽  
Rositza Yakimova

Specific on-resistance Ron estimated from current density-voltage characteristics of Schottky diodes on thick layers exhibits variations from tens of mW.cm2 to tens of W.cm2 for different doping levels. In order to understand the occurrence of high on-state resistance, Schottky barrier heights were first estimated for both forward and reverse bias with the application of thermionic emission theory and were in agreement with a literature reported values. Decrease in mobility with the temperature was observed and its dependencies of T–1.3 and T–2.0 for moderately doped and low doped samples respectively were estimated. From deep level measurements by Minority Carrier Transient Spectroscopy, an influence of shallow boron related levels and D-center on dependence of on-state resistance was observed, being more pronounced in low doped samples. Similar tendency was observed in depth profiling of Ron. This suggests a major role of boron in a compensation mechanism thus resulting in high Ron.


2000 ◽  
Vol 5 (S1) ◽  
pp. 922-928
Author(s):  
A. Hierro ◽  
D. Kwon ◽  
S. A. Ringel ◽  
M. Hansen ◽  
U. K. Mishra ◽  
...  

The deep level spectra in both p+-n homojunction and n-type Schottky GaN diodes are studied by deep level transient spectroscopy (DLTS) in order to compare the role of the junction configuration on the defects found within the n-GaN layer. Both majority and minority carrier DLTS measurements are performed on the diodes allowing the observation of both electron and hole traps in n-GaN. An electron level at Ec−Et=0.58 and 0.62 V is observed in the p+-n and Schottky diodes, respectively, with a concentration of ∼3−4×1014 cm−3 and a capture cross section of ∼1−5×10−15 cm2. The similar Arrhenius behavior indicates that both emissions are related to the same defect. The shift in activation energy is correlated to the electric field enhanced-emission in the p+-n diode, where the junction barrier is much larger. The p+-n diode configuration allows the observation of a hole trap at Et−Ev=0.87 eV in the n-GaN which is very likely related to the yellow luminescence band.


2009 ◽  
Vol 42 (15) ◽  
pp. 153001 ◽  
Author(s):  
E V Monakhov ◽  
A Yu Kuznetsov ◽  
B G Svensson

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