Stress relaxation in polymethyl methacrylate in liquid media

1972 ◽  
Vol 5 (3) ◽  
pp. 283-285
Author(s):  
A. N. Tynnyi ◽  
V. M. Gural ◽  
N. G. Kalinin ◽  
A. I. Soshko
1972 ◽  
Vol 5 (3) ◽  
pp. 242-244
Author(s):  
A. N. Tynnyi ◽  
Z. A. Bazilevich ◽  
S. I. Mikitishin ◽  
Ya. I. Lavrentovich ◽  
G. V. Karpenko

1973 ◽  
Vol 7 (2) ◽  
pp. 179-181
Author(s):  
A. N. Tynnyi ◽  
N. A. Ol'khovich-Novosadyuk ◽  
A. I. Soshko ◽  
N. G. Kalinin ◽  
B. V. Perov

Author(s):  
N. Rozhanski ◽  
V. Lifshitz

Thin films of amorphous Ni-Nb alloys are of interest since they can be used as diffusion barriers for integrated circuits on Si. A native SiO2 layer is an effective barrier for Ni diffusion but it deformation during the crystallization of the alloy film lead to the appearence of diffusion fluxes through it and the following formation of silicides. This study concerns the direct evidence of the action of stresses in the process of the crystallization of Ni-Nb films on Si and the structure of forming NiSi2 islands.


2020 ◽  
Vol 129 (3) ◽  
pp. 237-247 ◽  
Author(s):  
Hsin-An Chang ◽  
Wen-Hui Fang ◽  
Yia-Ping Liu ◽  
Nian-Sheng Tzeng ◽  
Jia-Fwu Shyu ◽  
...  

1987 ◽  
Vol 48 (C8) ◽  
pp. C8-3-C8-13 ◽  
Author(s):  
J. KUBÁT ◽  
M. RIGDAHL
Keyword(s):  

1990 ◽  
Vol 51 (C2) ◽  
pp. C2-603-C2-606 ◽  
Author(s):  
E. RIERA-FRANCO DE SARABIA ◽  
A. RAMOS-FERNANDEZ ◽  
L . GOMEZ-ULLATE

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