Effect of water on the kinetics of fatigue failure in steel 00Kh12N3D

1979 ◽  
Vol 15 (1) ◽  
pp. 12-17
Author(s):  
L. I. Domozhirov
2021 ◽  
Vol 314 ◽  
pp. 60-65
Author(s):  
Taegun Park ◽  
Sangwoo Lim

Tetramethylammonium hydroxide (TMAH) is a metal-free strong alkaline solution which can etch poly-Si. The concentration of dissolved gas as well as the concentration of TMAH affects etching rate of poly-Si. The detailed kinetics of poly-Si etching in TMAH solution is investigated in this study. The effect of water and TMAH concentration on the etching kinetics of poly-Si was investigated by using various concentrations of TMAH solution. It is found that H2O in TMAH solution plays an important role in etching poly-Si. Presence of dissolved CO2 and O2 in TMAH solution tends to inhibit etching of poly-Si. The concentration of dissolved CO2 and O2 in TMAH were reduced by Ar bubbling, thereby the poly-Si etching rate increased.


1992 ◽  
Vol 28 (5) ◽  
pp. 436-441
Author(s):  
S. V. Safronov ◽  
D. A. Molodov ◽  
B. M. Sakulin

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