Reflection spectra of impurity-containing gallium phosphide single crystals

1979 ◽  
Vol 30 (4) ◽  
pp. 522-523
Author(s):  
V. V. Sobolev ◽  
V. I. Donetskikh ◽  
E. F. Zagainov
2021 ◽  
Vol 1753 (1) ◽  
pp. 012077
Author(s):  
A Kh Matiyev ◽  
R T Uspazhiev ◽  
A M Gachaev ◽  
I A Sysoev ◽  
B M Khamkhoev ◽  
...  

2007 ◽  
Vol 142 (5) ◽  
pp. 256-260
Author(s):  
E.A. Vinogradov ◽  
V.A. Yakovlev ◽  
N.N. Novikova ◽  
M.N. Popova ◽  
S.K. Saikin ◽  
...  

1998 ◽  
Vol 92 (1-3) ◽  
pp. 247-250 ◽  
Author(s):  
T. Sekiya ◽  
M. Igarashi ◽  
S. Kurita ◽  
S. Takekawa ◽  
M. Fujisawa

1988 ◽  
Vol 144 ◽  
Author(s):  
J. M. Zavada ◽  
R. G. Wilson ◽  
S. W. Novak ◽  
S. J. Pearton ◽  
A. R. Von Neida

ABSTRACTIn this paper we report on the depth distributions of implanted hydrogen in GaP crystals and the subsequent changes produced by post- implantation furnace annealing. A sulfur doped n+ GaP wafer has been implanted with 333 keV protons to a fluence of 5E15/cm+2. A similar wafer was implanted with 350 keV deuterons to the same fluence. Portions of each wafer have been furnace annealed at temperatures up to 500°C. The implanted hydrogen and the dopant S atoms were then depth profiled using secondary ion mass spectrometry (SIMS). The measurements show that the redistribution of hydrogen begins with annealing at about 300°C and proceeds both towards the surface and deeper into the substrate. The overall behavior is similar to that found previously for hydrogen in GaAs. However, in GaP crystals this redistribution begins at a higher temperature and proceeds more slowly in the implanted region. Based on the SIMS profiles, diffusion coefficients for hydrogen migrating into substrate are obtained.


1981 ◽  
Vol 54 (2) ◽  
pp. 348-357 ◽  
Author(s):  
Kyuya Yakushi ◽  
Masaaki Iguchi ◽  
Gen Katagiri ◽  
Takahisa Kusaka ◽  
Toshiaki Ohta ◽  
...  

1976 ◽  
Vol 12 (1) ◽  
pp. 89-105 ◽  
Author(s):  
R.R. Pennelly ◽  
C.J. Eckhardt

1979 ◽  
Vol 94 (1) ◽  
pp. K31-K34 ◽  
Author(s):  
K. R. Allakhverdiev ◽  
A. N. Abbasov ◽  
T. R. Mekhtiev ◽  
R. Kh. Nani

1980 ◽  
Vol 61 (2) ◽  
pp. K163-K165 ◽  
Author(s):  
M. V. Kurik ◽  
C. Hamann ◽  
M. Starke ◽  
L. I. Tsikora

1975 ◽  
Vol 39 (2) ◽  
pp. 448-450 ◽  
Author(s):  
Hiroyasu Shimizu ◽  
Yoshikazu Ohbayashi ◽  
Keiichi Yamamoto ◽  
Kenji Abe ◽  
Michio Midorikawa ◽  
...  

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