Nucleation behaviour of diamond particles on silicon substrates in a hot-filament chemical vapour deposition

1993 ◽  
Vol 28 (7) ◽  
pp. 1799-1804 ◽  
Author(s):  
Soon-Sup Park ◽  
Jai-Young Lee
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Silicon Substrates ◽  
Diamond Particles ◽  
Hot Filament

Nucleation of diamond particles by hot filament chemical vapour deposition

1993 ◽  
Vol 236 (1-2) ◽  
pp. 115-119 ◽  
Author(s):  
Kazunori Tamaki ◽  
Yoshihisa Watanabe ◽  
Yoshikazu Nakamura ◽  
Shigekazu Hirayama
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Diamond Particles ◽  
Hot Filament

Growth and photoluminescence of oriented MoSe2nanosheets produced by hot filament CVD

RSC Advances ◽  
2016 ◽  
Vol 6 (43) ◽  
pp. 37236-37245 ◽  
Author(s):  
B. B. Wang ◽  
K. Ostrikov ◽  
T. van der Laan ◽  
K. Zheng ◽  
R. Shao ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Silicon Substrates ◽  
Hot Filament Cvd ◽  
Hot Filament

Oriented MoSe2nanosheets with varying layers and structures were synthesized on silicon substrates by hot filament chemical vapour deposition in a nitrogen environment using MoO3and Se powders as precursors.

scholarly journals Self-organized graphene-like boron nitride containing nanoflakes on copper by low-temperature N2 + H2 plasma

RSC Advances ◽  
2016 ◽  
Vol 6 (90) ◽  
pp. 87607-87615 ◽  
Author(s):  
B. B. Wang ◽  
D. Gao ◽  
I. Levchenko ◽  
K. Ostrikov ◽  
M. Keidar ◽  
...  
Keyword(s):  
Low Temperature ◽  
Boron Nitride ◽  
Chemical Vapour Deposition ◽  
Efficient Method ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Self Organized ◽  
Reactive Gases ◽  
Hot Filament

A simple and efficient method for synthesizing complex graphene-inspired BNCO nanoflakes by plasma-enhanced hot filament chemical vapour deposition using B4C as a precursor and N2/H2 reactive gases is reported.

Synthesis of Nano-Crystalline Diamond Film in Hot Filament Chemical Vapour Deposition by Adding Ar

2001 ◽  
Vol 18 (2) ◽  
pp. 286-288 ◽  
Author(s):  
Zhang Yu-Feng ◽  
Zhang Fan ◽  
Gao Qiao-Jun ◽  
Yu Da-Peng ◽  
Peng Xiao-Fu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Nano Crystalline ◽  
Hot Filament

Silicon carbide emitter diodes by LPCVD (low-pressure chemical vapour deposition) using di-tert-butylsilane

1992 ◽  
Vol 70 (10-11) ◽  
pp. 946-948
Author(s):  
S. B. Hewitt ◽  
S.-P. Tay ◽  
N. G. Tarr ◽  
A. R. Boothroyd
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Silicon Substrates ◽  
Phosphorus Doping ◽  
Forward Current ◽  
Pressure Chemical ◽  
Sic Films

Stoichiometric SiC films formed by low-pressure chemical vapour deposition from a di-tert-butylsilane source with in situ phosphorus doping from tert-butylphosphine were used as emitters in heterojunction diodes fabricated on lightly doped silicon substrates. Diode characteristics are nearly ideal, with forward current dominated by injection-diffusion in the silicon substrate.

Plasma diagnosis in d.c.-biased hot-filament-assisted chemical vapour deposition by double-probe method

1993 ◽  
Vol 2 (2-4) ◽  
pp. 476-480
Author(s):  
Zhenwu Xuan ◽  
Peichun Yang ◽  
Xin Pu ◽  
Erkai Liu ◽  
Lichang Qi ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Probe Method ◽  
Double Probe ◽  
Plasma Diagnosis ◽  
Hot Filament

Wear of HFACVD Diamond Coated Tools in Turning of MMC

Volume 3 ◽  
2004 ◽  
Author(s):  
A. Boschetto ◽  
F. Veniali
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Soft Materials ◽  
Industrial Applications ◽  
Ferrous Alloys ◽  
Coated Tools ◽  
Hot Filament ◽  
Pcd Tools

HFACVD (Hot Filament Assisted Chemical Vapour Deposition) is a typical technology which permits the coating of soft materials with hard or super hard layers which lead to ultra wear resistant tools. Typical tools obtained with this technology are based on a diamond layer. Unfortunately, these tools are not suitable for machining of ferrous alloys due to chemical issues, yet their use is very promising in the machining of composites based on aluminium matrix and reinforced with alumina or silicon carbide. In this paper HFACVD diamond coated, WC and PCD tools are used in turning of Al2O3/Al composites until they are completely worn out. The results show that the diamond tools can be competitive with both the WC and PCD ones in the industrial applications.

Sign in / Sign up

Export Citation Format

Share Document