Laser physico-chemical vapour deposition of cubic boron nitride thin films

1994 ◽  
Vol 29 (21) ◽  
pp. 5646-5656 ◽  
Author(s):  
P. A. Molian
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Cubic Boron Nitride ◽  
Chemical Vapour ◽  
Physico Chemical

Preparation of cubic boron nitride films by plasma-enhanced chemical vapour deposition of BF3, N2 and H2 gas mixtures

1991 ◽  
Vol 49 (1-3) ◽  
pp. 422-426 ◽  
Author(s):  
Juan Manuel Mendez ◽  
Stephen Muhl ◽  
Mario Farias ◽  
Gabriel Soto ◽  
Leonel Cota-Araiza
Keyword(s):  
Boron Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Cubic Boron Nitride ◽  
Chemical Vapour ◽  
Gas Mixtures ◽  
Boron Nitride Films

Investigation of the Growth Behaviour of Cobalt Thin Films from Chemical Vapour Deposition, Using Directly Coupled X-ray Photoelectron Spectroscopy

2015 ◽  
Vol 229 (10-12) ◽  
Author(s):  
Patrick Hervé Tchoua Ngamou ◽  
Achraf El Kasmi ◽  
Theodor Weiss ◽  
Henning Vieker ◽  
André Beyer ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Substrate Selection ◽  
Flow Conditions ◽  
Growth Behaviour ◽  
Physico Chemical ◽  
Cobalt Thin Films

AbstractThin films and coatings are a basis for many technological processes, including microelectronics, electrochemistry and catalysis. The successful deposition of metal films and nanoparticles by chemical vapour deposition (CVD) needs control over a number of physico-chemical processes such as precursor and substrate selection, delivery, temperature, pressure and flow conditions. Here, cobalt thin films were deposited by means of pulsed-spray evaporation chemical vapour deposition (PSE-CVD) from ethanol solutions of Co(acac)

scholarly journals Chemical vapour deposition of epitaxial rhombohedral BN thin films on SiC substrates

CrystEngComm ◽  
2014 ◽  
Vol 16 (24) ◽  
pp. 5430-5436 ◽  
Author(s):  
M. Chubarov ◽  
H. Pedersen ◽  
H. Högberg ◽  
Zs. Czigany ◽  
A. Henry
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Boron Nitride ◽  
Epitaxial Growth ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thermally Activated ◽  
Rhombohedral Boron

Epitaxial growth of rhombohedral boron nitride (r-BN) on different polytypes of silicon carbide (SiC) is demonstrated using thermally activated hot-wall chemical vapour deposition and triethyl boron and ammonia as precursors.

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