Effective UV photolytic decomposition of organic compounds with a low-pressure mercury lamp as pretreatment for voltammetric analysis of trace metals

1995 ◽  
Vol 352 (6) ◽  
pp. 547-549 ◽  
Author(s):  
Kunihiko Yokoi ◽  
Toyomi Tomisaki ◽  
Tsutomu Koide ◽  
Constant M. G. van den Berg
Keyword(s):  
Trace Metals ◽  
Organic Compounds ◽  
Low Pressure ◽  
Mercury Lamp ◽  
Voltammetric Analysis ◽  
Photolytic Decomposition

Removal of Trace Metals From Wastewater by Activated Carbon

1973 ◽  
Vol 8 (1) ◽  
pp. 110-121
Author(s):  
A. Netzer ◽  
J.D. Norman
Keyword(s):  
Activated Carbon ◽  
Trace Metals ◽  
Organic Compounds ◽  
The Other ◽  
Published Data ◽  
Ph Adjustment ◽  
Nickel Silver ◽  
Ph Range ◽  
Carbon Treatment ◽  
Cobalt Copper

Abstract The merits of activated carbon for removal of organic compounds from wastewater have been well documented in the literature. On the other hand there is a lack of published data on the use of activated carbon for the removal of trace metals from wastewater. Experiments were designed to assess the possibility that activated carbon treatment would remove aluminum, cadmium, chromium, cobalt, copper, iron, lead, manganese, mercury, nickel, silver and zinc from wastewater. All metals studied were tested over the pH range 3-11. Greater than 99.5% removal was achieved by pH adjustment and activated carbon treatment for most of the metals tested.

Low-pressure mercury lamp pumped atomic iodine laser of high efficiency

1979 ◽  
Vol 28 (2) ◽  
pp. 202-206 ◽  
Author(s):  
K.J. Witte ◽  
P. Burkhard ◽  
H.R. Lüthi
Keyword(s):  
High Efficiency ◽  
Low Pressure ◽  
Mercury Lamp ◽  
Iodine Laser ◽  
Atomic Iodine

Comparison of the Processes Induced by Mercury Lamp and ArF Excimer Laser Photoassisted CVD of a-Si:H Films

1986 ◽  
Vol 75 ◽  
Author(s):  
C. Fuchs ◽  
E. Fogarassy
Keyword(s):  
Excimer Laser ◽  
Low Pressure ◽  
Reaction Chamber ◽  
Mercury Lamp ◽  
Silicon Deposition ◽  
Arf Excimer Laser

AbstractWe compare, in this study, the photoassisted processes for silicon deposition using both a low pressure mercury lamp and an ArF excimer laser for the specific case where the SiH4 gas is sealed in the reaction chamber.

Sign in / Sign up

Export Citation Format

Share Document