Sensitivity of a Power Supply Damping Method to Resistance and Current Waveform Variations

2006 ◽  
pp. 496-503
Author(s):  
Jürgen Rauscher ◽  
Hans-Jörg Pfleiderer
Keyword(s):  
Power Supply ◽  
Current Waveform

scholarly journals A high-current, high-voltage power supply with special output current waveform for APS injector synchrotron dipole magnets

1992 ◽  
Vol 39 (4) ◽  
pp. 1175-1179
Author(s):  
M. Fathizadeh ◽  
O.D. Despe ◽  
D.G. McGhee ◽  
F.E. Mills ◽  
L.R. Turner
Keyword(s):  
High Voltage ◽  
Power Supply ◽  
High Current ◽  
Current Waveform ◽  
Output Current ◽  
High Voltage Power Supply

Study on the Chaos Phenomenon of the DC-DC Buck Switching Power Supply

2013 ◽  
Vol 764 ◽  
pp. 181-184 ◽  
Author(s):  
X.L. Duan
Keyword(s):  
Simulation Model ◽  
Power Supply ◽  
Output Voltage ◽  
Stable State ◽  
Switching Power Supply ◽  
Current Waveform ◽  
Switching Power ◽  
Unstable Cycle

The simulation model of the DC-DC buck switching power supply was built. The chaos phenomenon of the DC-DC buck switching power supply was studied by the simulation. The simulation result showed a point was described in the chaos figure of the output voltage or current waveform of the system when the system was in a stable state. When the chaos of the system was happened for some reason, the system became unstable, cycle presented infinity and all point may not fall in the same position, at the same time also meaning the chaos phenomenon has happened, so in the figure could describe countless different point.

scholarly journals Investigation of HID-lamp light emission differences for different power supply methods

2016 ◽  
Vol 64 (4) ◽  
pp. 915-923
Author(s):  
K. Tomczuk ◽  
P. Mazurek ◽  
L. Hemka ◽  
A. Kasprowicz ◽  
T. Błażejczyk
Keyword(s):  
Significant Influence ◽  
Power Supply ◽  
Light Emission ◽  
Plasma Channel ◽  
Plasma Temperature ◽  
Power Converter ◽  
Switching Frequency ◽  
Current Waveform ◽  
Plasma Parameters ◽  
High Switching Frequency

Abstract This paper presents investigation of methods for reducing light pulsation and plasma temperature inside a high intensity discharge (HID) lamp arc tube. Differences found in light emission of an arc tube plasma channel under different power supply methods are presented and discussed in this work. The novelty of the paper lies in systematical investigation of different power converter supply methods and demonstrating that it has a significant influence on plasma temperature in an arc tube. The tested lamp was powered by electronic ballasts controlled by different algorithms, which forced their current waveform. To compare the results, the authors performed measurements on a discharge lamp powered by a standard electromagnetic ballast. The investigation of plasma parameters is based on the optical spectroscopy method. It was shown that by using the appropriate current shape of a high switching frequency supply converter, the plasma temperature of an HID lamp can be reduced almost by half.

Capacitor Group Zero-Crossing Switching Control System Design

2013 ◽  
Vol 748 ◽  
pp. 506-509
Author(s):  
Dao Shun Wang ◽  
Qiang Zou
Keyword(s):  
Power Supply ◽  
Power Supply System ◽  
Supply System ◽  
Control System Design ◽  
Current Waveform ◽  
Voltage Waveform ◽  
Inductive Load ◽  
Zero Crossing ◽  
Current Zero ◽  
Great Harm

Nowadays, the most of the load is inductive load in the factory. However, power factor is reduced by the phase difference of voltage waveform and current waveform which made by inductor. So many company adopt the compensation mode of parallel capacitor. However, randomly switch for capacitor group make the great harm to power supply system. In order to solve this problem, this paper designs a kind of intelligent synchronous switch. This switch can be switched in the alternating current zero. This switch takes PIC16F877A as core, using of magnetic keeping relay as the executing agency. The experimental results show that the design of this system is reasonable and can make more contribute to enhance the transmission electric efficiency of electrical factory.

New replica method with plasma polymerized film by glow discharge

1988 ◽  
Vol 46 ◽  
pp. 414-415
Author(s):  
A. Tanaka ◽  
M. Yamaguchi ◽  
T. Hirano
Keyword(s):  
Power Supply ◽  
Plasma Polymerization ◽  
Vacuum Chamber ◽  
Complex Surface ◽  
Replica Method ◽  
Metal Extraction ◽  
High Voltage Power Supply ◽  
Negative Glow ◽  
Hydrocarbon Gas ◽  
Hydrocarbon Molecules

The plasma polymerization replica method and its apparatus have been devised by Tanaka (1-3). We have published several reports on its application: surface replicas of biological and inorganic specimens, replicas of freeze-fractured tissues and metal-extraction replicas with immunocytochemical markers.The apparatus for plasma polymerization consists of a high voltage power supply, a vacuum chamber containing a hydrocarbon gas (naphthalene, methane, ethylene), and electrodes of an anode disk and a cathode of the specimen base. The surface replication by plasma polymerization in negative glow phase on the cathode was carried out by gassing at 0.05-0.1 Torr and glow discharging at 1.5-3 kV D.C. Ionized hydrocarbon molecules diffused into complex surface configurations and deposited as a three-dimensionally polymerized film of 1050 nm in thickness.The resulting film on the complex surface had uniform thickness and showed no granular texture. Since the film was chemically inert, resistant to heat and mecanically strong, it could be treated with almost any organic or inorganic solvents.

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