Strain-Relief at Internal Dielectric Interfaces in High-k Gate Stacks with Transition Metal and Rare Earth Atom Oxide Dielectrics
Keyword(s):
High K
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2004 ◽
Vol 22
(4)
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pp. 2097
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Keyword(s):
2009 ◽
Vol 12
(5)
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pp. G17
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Keyword(s):
2004 ◽
Vol 16
(44)
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pp. S5139-S5151
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2006 ◽
Vol 16
(01)
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pp. 241-261
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2004 ◽
Vol 241
(10)
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pp. 2221-2235
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