Directed Self-assembly of 2-Dimensional Mesoblocks Using Top-Down/Bottom-Up Design

2005 ◽  
pp. 154-166 ◽  
Author(s):  
Geoff Poulton ◽  
Ying Guo ◽  
Geoff James ◽  
Phil Valencia ◽  
Vadim Gerasimov ◽  
...  
Keyword(s):  
Self Assembly ◽  
Top Down ◽  
Bottom Up

scholarly journals Multiscale additive manufacturing of polymers using 3D photo-printable self-assembling ionic liquid monomers

2019 ◽  
Vol 4 (3) ◽  
pp. 580-585 ◽  
Author(s):  
Bineh G. Ndefru ◽  
Bryan S. Ringstrand ◽  
Sokhna I.-Y. Diouf ◽  
Sönke Seifert ◽  
Juan H. Leal ◽  
...  
Keyword(s):  
Ionic Liquid ◽  
Additive Manufacturing ◽  
Self Assembly ◽  
Low Cost ◽  
Low Resolution ◽  
Top Down ◽  
Bottom Up ◽  
Cost Approach ◽  
Self Assembling ◽  
Nanoscale Features

Combining bottom-up self-assembly with top-down 3D photoprinting affords a low cost approach for the introduction of nanoscale features into a build with low resolution features.

Block Copolymer Films Hierarchical Assembly in Confinement

2007 ◽  
Vol 364-366 ◽  
pp. 437-441
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun ◽  
Yong Da Yan
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Structural Control ◽  
Computer Control ◽  
The Self ◽  
Top Down ◽  
Bottom Up ◽  
Dimensional Precision ◽  
Periodic Arrays ◽  
Copolymer Films

Ultrathin block copolymer films are promising candidates for bottom-up nanotemplates in hybrid organic-inorganic electronic, optical, and magnetic devices. Key to many future applications is the long range ordering and precise placement of the phase-separated nanoscale domains. In this paper, a combined top-down/bottom-up hierarchical approach is presented on how to fabricate massive arrays of aligned nanoscale domains by means of the self-assembly of asymmetric poly (styrene-block-ethylene/butylenes-block-styrene) (SEBS) tirblock copolymers in confinement. The periodic arrays of the poly domains were orientated via the introduction of AFM micromachining technique as a tool for locally controlling the self-assembly process of triblock copolymers by the topography of the silicon nitride substrate. Using the controlled movement of 2- dimensional precision stage and the micro pressure force between the tip and the surface by computer control system, an artificial topographic pattern on the substrate can be fabricated precisely. Coupled with solvent annealing technique to direct the assembly of block copolymer, this method provides new routes for fabricating ordered nanostructure. This graphoepitaxial methodology can be exploited in hybrid hard/soft condensed matter systems for a variety of applications. Moreover, Pairing top-down and bottom-up techniques is a promising, and perhaps necessary, bridge between the parallel self-assembly of molecules and the structural control of current technology.

Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes

MRS Bulletin ◽  
2005 ◽  
Vol 30 (12) ◽  
pp. 952-966 ◽  
Author(s):  
Craig J. Hawker ◽  
Thomas P. Russell
Keyword(s):  
Self Assembly ◽  
Polymer Chains ◽  
Top Down ◽  
Bottom Up ◽  
Robust Solution ◽  
Size Scale ◽  
Design And Synthesis ◽  
Manufacturing Techniques ◽  
Future Demands ◽  
Alternative Routes

AbstractAs the size scale of device features becomes ever smaller, conventional lithographic processes become increasingly more difficult and expensive, especially at a minimum feature size of less than 45 nm. Consequently, to achieve higher-density circuits, storage devices, or displays, it is evident that alternative routes need to be developed to circumvent both cost and manufacturing issues.An ideal process would be compatible with existing technological processes and manufacturing techniques; these strategies, together with novel materials, could allow significant advances to be made in meeting both short-term and long-term demands for higher-density, faster devices. The self-assembly of block copolymers (BCPs), two polymer chains covalently linked together at one end, provides a robust solution to these challenges. As thin films, immiscible BCPs self-assemble into a range of highly ordered morphologies where the size scale of the features is only limited by the size of the polymer chains and are, therefore, nanoscopic.While self-assembly alone is sufficient for a number of applications in fabricating advanced microelectronics, directed, self-orienting, self-assembly processes are also required to produce complex devices with the required density and addressability of elements to meet future demands. Both strategies require the design and synthesis of polymers that have well-defined characteristics such that the necessary fine control over the morphology, interfacial properties, and simplicity of processes can be realized. By combining tailored self-assembly processes (a “bottom-up” approach) with microfabrication processes (a “top-down” approach), the ever-present thirst of the consumer for faster, better, and cheaper devices can be met in very simple, yet robust, ways. The integration of novel chemistries with the manipulation of self-assembly will be treated in this article.

Special Issue on Texturing Processes and Attainable Functionalities

2016 ◽  
Vol 10 (1) ◽  
pp. 3-3
Author(s):  
Nobuyuki Moronuki
Keyword(s):  
Self Assembly ◽  
Special Issue ◽  
Top Down ◽  
Bottom Up ◽  
Energy Beam ◽  
Surface Functionality ◽  
Material Deposition ◽  
Wide Range ◽  
Lotus Leaves ◽  
Optical Applications

Regular micro/nanostructures or textures provide such functions as optical or friction properties, but neither texture design nor the texturing process has been well developed. Functional texture is often inspired by natural designs, with the microstructure on the surface of lotus leaves or the nanostructure on the bottoms of geckos’ feet often cited as examples. “Biomimetic” has become a keyword in state-of-the-art technologies. Processes are also important because functional textures require a wide range of structural dimensions, from nanometers to micrometers. Top-down processes such as cutting or energy beam processing are often used and are based on the copying principle. Bottom-up processes include the self-assembly of particles and the anodic oxidation of aluminum. As the principle behind bottom-up processes is completely different from that behind top-down processes, special attention is warranted. Furthermore, material deposition can effect drastic changes in surface functionality. This special issue features nine papers, including eight studies and one review paper, classified into the following topics: - Biomimetic design of functions - Top-down or cutting texturing processes - Bottom-up or self-organization texturing processes - Measurement system for textures - Optical applications - Optical applications - Adhesive applications - Biomedical applications These papers present the latest advances in texturing processes, functional design, and realization or demonstration. Learning more about these advances will enable readers toshare their knowledge and experience in technologies, development, and potential texturing applications. In closing, I would like to express my sincere gratitude to the authors and reviewers for their interesting and enlightening contributions to this special issue.

scholarly journals Combining Bottom-Up Self-Assembly with Top-Down Microfabrication to Create Hierarchical Inverse Opals with High Structural Order

Small ◽  
2015 ◽  
Vol 11 (34) ◽  
pp. 4334-4340 ◽  
Author(s):  
Manuel Schaffner ◽  
Grant England ◽  
Mathias Kolle ◽  
Joanna Aizenberg ◽  
Nicolas Vogel
Keyword(s):  
Self Assembly ◽  
Top Down ◽  
Bottom Up ◽  
Inverse Opals ◽  
Structural Order

Perceiving Zeolite Self-Assembly: A Combined Top-Down and Bottom-Up Approach within the Tiling Model

2019 ◽  
Vol 124 (2) ◽  
pp. 1523-1528
Author(s):  
Andrey A. Golov ◽  
Olga A. Blatova ◽  
Vladislav A. Blatov
Keyword(s):  
Self Assembly ◽  
Top Down ◽  
Bottom Up

“Bottom-Up” Meets “Top-Down” Assembly in Nanoscale Polyoxometalate Clusters: Self-Assembly of [P4W52O178]24−and Disassembly to [P3W39O134]19−

2008 ◽  
Vol 130 (45) ◽  
pp. 14946-14947 ◽  
Author(s):  
Chullikkattil P. Pradeep ◽  
De-Liang Long ◽  
Carsten Streb ◽  
Leroy Cronin
Keyword(s):  
Self Assembly ◽  
Top Down ◽  
Bottom Up

Controlled Kinetic Monte Carlo Simulation for Computer-Aided Nanomanufacturing

2015 ◽  
Vol 4 (1) ◽  
Author(s):  
Yan Wang
Keyword(s):  
Monte Carlo ◽  
Self Assembly ◽  
Formal Model ◽  
Kinetic Monte Carlo ◽  
Rare Event ◽  
Top Down ◽  
Efficient Tool ◽  
Bottom Up ◽  
Event Simulation ◽  
Physical And Chemical

Kinetic Monte Carlo (KMC) is regarded as an efficient tool for rare event simulation and has been applied in simulating bottom–up self-assembly processes of nanomanufacturing. Yet it has limitations to simulate top–down processes. In this paper, a new and generalized KMC mechanism, called controlled KMC or controlled KMC (cKMC), is proposed to simulate complete physical and chemical processes. This generalization is enabled by the introduction of controlled events. In contrast to the traditional self-assembly events in KMC, controlled events occur at certain times, locations, or directions, which allows all events to be modeled. A formal model of cKMC is also presented to show the generalization. The applications of cKMC to several top–down and bottom–up processes are demonstrated.

scholarly journals Uniform metal nanostructures with long-range order via three-step hierarchical self-assembly

2015 ◽  
Vol 1 (10) ◽  
pp. e1500751 ◽  
Author(s):  
Denise J. Erb ◽  
Kai Schlage ◽  
Ralf Röhlsberger
Keyword(s):  
Self Assembly ◽  
Large Scale ◽  
Crystal Surface ◽  
Microphase Separation ◽  
Magnetic Data ◽  
Metal Nanostructures ◽  
Top Down ◽  
Bottom Up ◽  
External Process

Large-scale nanopatterning is a major issue in nanoscience and nanotechnology, but conventional top-down approaches are challenging because of instrumentation and process complexity while often lacking the desired spatial resolution. We present a hierarchical bottom-up nanopatterning routine using exclusively self-assembly processes: By combining crystal surface reconstruction, microphase separation of copolymers, and selective metal diffusion, we produce monodisperse metal nanostructures in highly regular arrays covering areas of square centimeters. In situ grazing incidence small-angle x-ray scattering during Fe nanostructure formation evidences an outstanding structural order in the self-assembling system and hints at the possibility of sculpting nanostructures using external process parameters. Thus, we demonstrate that bottom-up nanopatterning is a competitive alternative to top-down routines, achieving comparable pattern regularity, feature size, and patterned areas with considerably reduced effort. Intriguing assets of the proposed fabrication approach include the option for in situ investigations during pattern formation, the possibility of customizing the nanostructure morphology, the capacity to pattern arbitrarily large areas with ultrahigh structure densities unachievable by top-down approaches, and the potential to address the nanostructures individually. Numerous applications of self-assembled nanostructure patterns can be envisioned, for example, in high-density magnetic data storage, in functional nanostructured materials for photonics or catalysis, or in surface plasmon resonance–based sensing.

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