5.4.2 Survey of multilayered films

2005 ◽  
pp. 290-293
Author(s):  
Y. Endoh ◽  
T. Shinjo ◽  
N. Hosoito
Keyword(s):  
Multilayered Films

GMR from RKKY Coupling in Multilayered Films

1999 ◽  
Vol 23 (1_2) ◽  
pp. 129-131
Author(s):  
Huang Zhigao ◽  
Cai Huang ◽  
Lai Hen ◽  
Zeng Minyoug
Keyword(s):  
Multilayered Films

Properties of indium oxide/tin oxide multilayered films prepared by ion-beam sputtering

1988 ◽  
Vol 23 (8) ◽  
pp. 3026-3030 ◽  
Author(s):  
Takeyuki Suzuki ◽  
Tsutomu Yamazaki ◽  
Harunobu Oda
Keyword(s):  
Indium Oxide ◽  
Tin Oxide ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Multilayered Films ◽  
Beam Sputtering

scholarly journals Structure and Characterization of TiC/GLC Multilayered Films with Various Bilayers Periods

Coatings ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 787
Author(s):  
Weiqi Wang ◽  
Xiaoming Ling ◽  
Rui Wang ◽  
Wenhao Nie ◽  
Li Ji ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Chemical Compositions ◽  
Closed Field ◽  
Multilayered Structures ◽  
Multilayered Films ◽  
Sputtering Deposition ◽  
X Ray ◽  
Mechanical And Tribological Properties ◽  
Self Organizing

The spontaneously self-organizing multilayered graphite-like carbon (denoted as GLC) /TiC films with various bilayer periods in the range of 13.3–17.5 nm were deposited on silicon and 1Cr18Mn8Ni5N stainless steel substrates using closed field magnetron sputtering deposition facility. The microstructures and chemical compositions of the prepared multilayered films were characterized by scanning electron microscopy, high resolution transmission electron microscopy, X-ray diffraction and X-ray photoelectron spectroscopy respectively. The self-organizing multilayered structures in all of the films consisted of titanium carbide layers and sp2-rich carbon layers periodically alternate arrangement. The TiC contents and bilayer periods of the multilayered films can be controlled by means of adjusting of sputtering current of graphite target. Furthermore, the mechanical and tribological performances of the prepared films were appraised by nano-indentor, scratch measures, and ball-on-plate tribometer respectively. The results indicated that multilayer structure endowed the as-deposited TiC/GLC films outstanding mechanical and tribological properties, especially the multilayer film with 15.9 nm bilayer period deposited at 10 A sputtering current showed the excellent adhesion strength and hardness; Simultaneously it also exhibited the lowest average friction coefficient in the humid environment owing to its high content of sp2 hybrid carbon.

Microstructural Evolution in Al-Ti Multilayered Film with Annealing

1999 ◽  
Vol 5 (S2) ◽  
pp. 836-837
Author(s):  
R. Mitra ◽  
W.A. Chiou ◽  
A.Madan ◽  
R. Hoffman ◽  
J.R. Weertman
Keyword(s):  
Magnetron Sputtering ◽  
Ingot Metallurgy ◽  
Multilayered Film ◽  
Multilayered Structures ◽  
Multilayered Films ◽  
Specific Strength ◽  
The Past ◽  
High Specific Strength ◽  
Significant Interest ◽  
Deposited Film

There has been a significant interest in the development of dispersion-hardened aluminum for many years for high specific strength and modulus. Such materials are usually processed by powder or ingot metallurgy routes. In this study, Al3 Ti dispersion hardened Al was obtained by annealing Al-Ti multilayers. Al-Ti multilayered films have been characterized in the past by observing the structure of the layers, as well as tensile properties and hardness. This paper reports the structure of Al-Ti multilayers and the evolution of matrix and dispersoid microstructure on annealing.The Al-Ti multilayered structures were prepared by magnetron sputtering using Al and Ti as targets and either Si (100) or NaCl as substrates. The bi-layer thickness was maintained around 16 nm with Ti constituting 12% of the total. The substrate was alternately moved below the Al and Ti targets for the purpose of deposition. The as-deposited film on the substrate and NaCl salts were annealed at 400°C for periods between 1 and 24 h in a vacuum (10−5 torr) furnace.

In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films

2011 ◽  
Vol 257 (7) ◽  
pp. 2707-2711 ◽  
Author(s):  
S. Bruijn ◽  
R.W.E. van de Kruijs ◽  
A.E. Yakshin ◽  
F. Bijkerk
Keyword(s):  
Reaction Mechanism ◽  
Diffusion Reaction ◽  
Multilayered Films ◽  
In Situ Study

Temperature-dependent impedance anomaly, microwave GMR and exchange-coupling in thin Ni/Cu multilayered films

1999 ◽  
Vol 33 (1) ◽  
pp. 34-40 ◽  
Author(s):  
Bijoy K Kuanr ◽  
S Gokhale ◽  
M Vedpathak ◽  
A V Kuanr ◽  
G Nimtz
Keyword(s):  
Exchange Coupling ◽  
Temperature Dependent ◽  
Multilayered Films
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