Surface modifications of aligned carbon nanotube thin films by Argon-ion sputtering

2012 ◽  
Vol 7 (4) ◽  
pp. 436-437 ◽  
Author(s):  
Fukunori Izumida ◽  
Rongbin Ye ◽  
Koji Ohta ◽  
Mamoru Baba ◽  
Michiko Kusunoki
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Surface Modifications ◽  
Ion Sputtering ◽  
Argon Ion

Temperature Dependence of Ar Sputtering of CoSi2 Thin Films on Si and SiO2

1991 ◽  
Vol 235 ◽  
Author(s):  
Q. Z. Hong ◽  
J. M. E. Harper
Keyword(s):  
Thin Films ◽  
Temperature Dependence ◽  
Etch Rate ◽  
Elevated Temperatures ◽  
Ion Sputtering ◽  
Second Stage ◽  
Silicide Layer ◽  
Initial Stage ◽  
Co Concentration ◽  
Argon Ion

ABSTRACTThe temperature dependence of 300 eV argon ion sputtering of CoSi2 thin films in the range 50–600°C has been investigated. At temperatures above 400°C, the etch rate of CoSi2 on Si is significantly reduced, while the underlying Si reacts with the Co atoms diffusing from the silicide surface. As a result, the silicide layer effectively moves into the substrate during Ar bombardment. During sputtering of CoSi2 on Sio2, the thickness of the silicide layer decreases almost linearly with bombarding time until all the silicide is removed. Similar behavior is observed in low temperature sputtering of CoSi2 on (100) Si and evaporated Si. However, at elevated temperatures (400°C< <600°C), sputtering of CoSi2 on Si undergoes two consecutive stages. During the initial stage, the thickness of the silicide layer decreases at the same rate as that of the silicide on SiO2, and is accompanied by an enrichment in Co concentration near the surface. During the second stage, the etch rate of the silicide is reduced to only one third of the rate during the initial stage.

Infrared Characterization of RF Sputter Etching of Polyimide Thin Films

1990 ◽  
Vol 203 ◽  
Author(s):  
S.E. Molis ◽  
D.G. Kim ◽  
S.P. Kowalczyk ◽  
J. Kim
Keyword(s):  
Thin Films ◽  
Infrared Spectroscopy ◽  
Structural Changes ◽  
Surface Damage ◽  
Ion Sputtering ◽  
Absorption Bands ◽  
Damage Layer ◽  
Intensity Changes ◽  
Argon Ion

ABSTRACTWe present infrared spectroscopy as a means of characterizing polyimide structural changes occurring by RF argon ion sputtering. Samples of PMDA-ODA polyimide on chromium coated substrates have been sputter etched from initial thicknesses of 400 Å down to 10 Å. Relative intensity changes in imide vibrational absorption bands have been interpreted in terms of orientational reordering which occurs during the ion sputtering process. The appearance of a new vibration at 1580 cm–1 in the spectra of samples etched below 50 Å is assigned as the Elu mode of graphite corresponding to a surface damage layer which is of a graphitic form.

scholarly journals Evaluation of aligned carbon nanotube thin film modified by an Argon-ion sputtering method

2011 ◽  
Vol 14 ◽  
pp. 164-166
Author(s):  
Fukunori Izumida ◽  
Rongbin Ye ◽  
Koji Ohta ◽  
Mamoru Baba ◽  
Michiko Kusunoki
Keyword(s):  
Thin Film ◽  
Carbon Nanotube ◽  
Ion Sputtering ◽  
Argon Ion

Carbon Nanotube Based Transparent Conductive Thin Films

2006 ◽  
Vol 6 (7) ◽  
pp. 1939-1944 ◽  
Author(s):  
X. Yu ◽  
R. Rajamani ◽  
K. A. Stelson ◽  
T. Cui
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Conductive Thin Films

Polarization-Controlled Two-Dimensional White-Light Spectroscopy of Semiconducting Carbon Nanotube Thin Films

2016 ◽  
Vol 120 (30) ◽  
pp. 17069-17080 ◽  
Author(s):  
Randy D. Mehlenbacher ◽  
Thomas J. McDonough ◽  
Nicholas M. Kearns ◽  
Matthew J. Shea ◽  
Yongho Joo ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
White Light ◽  
Two Dimensional

The effect of oxidation treatment on the properties of multi-walled carbon nanotube thin films

2009 ◽  
Vol 165 (3) ◽  
pp. 135-138 ◽  
Author(s):  
Zdenko Špitalský ◽  
Christos Aggelopoulos ◽  
Georgia Tsoukleri ◽  
Christos Tsakiroglou ◽  
John Parthenios ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Oxidation Treatment ◽  
Multi Walled Carbon Nanotube

Solution‐Processed Chemically Non‐Destructive Filter Transfer of Carbon‐Nanotube Thin Films onto Arbitrary Materials

2021 ◽  
pp. 2100953
Author(s):  
Manabu Ishizaki ◽  
Daiki Satoh ◽  
Rin Ando ◽  
Mikuto Funabe ◽  
Jun Matsui ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Solution Processed ◽  
Non Destructive
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