A new, optical measuring technique for the determination of the vapour film thickness during film boiling

1995 ◽  
Vol 66 (6) ◽  
pp. 244-250 ◽  
Author(s):  
Reiner Weichert ◽  
Rudolf Jeschar ◽  
Walter Klemm ◽  
Viktor Heidt ◽  
Patrick Thibor ◽  
...  
Keyword(s):  
Film Thickness ◽  
Measuring Technique ◽  
Film Boiling ◽  
Optical Measuring ◽  
Optical Measuring Technique ◽  
Vapour Film

Measurement of R-curve in clay brick blocks using optical measuring technique

2014 ◽  
Vol 121-122 ◽  
pp. 1-10 ◽  
Author(s):  
Lorenzo Graziani ◽  
Marcin Kneć ◽  
Tomasz Sadowski ◽  
Marco D’Orazio ◽  
Stefano Lenci
Keyword(s):  
Measuring Technique ◽  
Clay Brick ◽  
Optical Measuring ◽  
Optical Measuring Technique

Characterization and Control of Copper CMP with Optoacoustic Metrology

2001 ◽  
Vol 671 ◽  
Author(s):  
Michael Gostein ◽  
Paul Lefevre ◽  
Alex A. Maznev ◽  
Michael Joffe
Keyword(s):  
Film Thickness ◽  
Spatial Resolution ◽  
Chemical Mechanical Polishing ◽  
High Spatial Resolution ◽  
Mechanical Polishing ◽  
Length Measurement ◽  
And Control ◽  
Non Destructive

ABSTRACTWe discuss applications of optoacoustic film thickness metrology for characterization of copper chemical-mechanical polishing (CMP). We highlight areas where the use of optoacoustics for CMP characterization provides data complementary to that obtained by other techniques because of its ability to directly measure film thickness with high spatial resolution in a rapid, non-destructive manner. Examples considered include determination of planarization length, measurement of film thickness at intermediate stages of polish, and measurement of arrays of metal lines.

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