Response to “Comment on ‘Tunable Design of Structural Colors Produced by Pseudo-1D Photonic Crystals of Graphene Oxide' and Thin-Film Interference from Dried Graphene Oxide Film”

Small ◽  
2017 ◽  
Vol 13 (15) ◽  
pp. 1700102 ◽  
Author(s):  
Liping Tong ◽  
Wei Qi ◽  
Mengfan Wang ◽  
Renliang Huang ◽  
Rongxin Su ◽  
...  
Keyword(s):  
Thin Film ◽  
Graphene Oxide ◽  
Photonic Crystals ◽  
Oxide Film ◽  
Structural Colors ◽  
Thin Film Interference

Templating nanotraffic light – dynamic tricoloured blinking silver nanoclusters on a graphene oxide film

2018 ◽  
Vol 6 (17) ◽  
pp. 4641-4648 ◽  
Author(s):  
S. X. Lim ◽  
Y. Z. Lee ◽  
N. Gao ◽  
J. Lu ◽  
Q. Xu ◽  
...  
Keyword(s):  
Thin Film ◽  
Silver Nanoparticles ◽  
Graphene Oxide ◽  
Oxide Film ◽  
Silver Nanoclusters ◽  
Site Selective ◽  
Selective Formation

Laser initiated site selective formation of dynamic tri-colour blinking silver nanoparticles on a transparent, flexible GO thin film.

scholarly journals Photonic Crystals: Tunable Design of Structural Colors Produced by Pseudo-1D Photonic Crystals of Graphene Oxide (Small 25/2016)

Small ◽  
2016 ◽  
Vol 12 (25) ◽  
pp. 3432-3432
Author(s):  
Liping Tong ◽  
Wei Qi ◽  
Mengfan Wang ◽  
Renliang Huang ◽  
Rongxin Su ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Photonic Crystals ◽  
Structural Colors

Tunable Design of Structural Colors Produced by Pseudo-1D Photonic Crystals of Graphene Oxide

Small ◽  
2016 ◽  
Vol 12 (25) ◽  
pp. 3433-3443 ◽  
Author(s):  
Liping Tong ◽  
Wei Qi ◽  
Mengfan Wang ◽  
Renliang Huang ◽  
Rongxin Su ◽  
...  
Keyword(s):  
Graphene Oxide ◽  
Photonic Crystals ◽  
Structural Colors

Surface Microstructure Evolution Upon Silicidation of Ni(Pt) and the Different Responses to Metal Etch

2013 ◽  
Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxide Film ◽  
Microstructure Evolution ◽  
Depth Profiling ◽  
Surface Microstructure ◽  
The Difference ◽  
Surface Microstructures ◽  
Pt Films

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.

Fabrication of layer-by-layer graphene oxide thin film on copper substrate by electrophoretic deposition

2020 ◽  
Vol 59 (12) ◽  
pp. 125001
Author(s):  
Nan Ye ◽  
Satoka Ohnishi ◽  
Mitsuhiro Okada ◽  
Kazuto Hatakeyama ◽  
Kazuhiko Seki ◽  
...  
Keyword(s):  
Thin Film ◽  
Graphene Oxide ◽  
Electrophoretic Deposition ◽  
Copper Substrate ◽  
Oxide Thin Film ◽  
Layer By Layer ◽  
Layer Graphene

Thin Film 2-d Photonic Crystals High-Performance Light-Emitting Diodes

1999 ◽  
Author(s):  
Eli Yablonovitch ◽  
Misha Boroditsky ◽  
Rutger Vrijen ◽  
Thomas F. Krauss ◽  
Roberto Coccioli
Keyword(s):  
Thin Film ◽  
Photonic Crystals ◽  
High Performance ◽  
Light Emitting Diodes ◽  
Light Emitting
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