Title: Periodic Mesoporous Hexagonal Boron Nitride at High Pressure: A Route to Cubic Boron Nitride Nanocrystals and Mesoporous Cubic Boron Nitride

2017 ◽  
Vol 2 (2) ◽  
pp. 740-744 ◽  
Author(s):  
Manik Mandal ◽  
Cong Liu ◽  
Toby Sanders ◽  
Fadi Haso ◽  
Venkata Bhadram ◽  
...  
Keyword(s):  
High Pressure ◽  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride

Effect of Al on the Formation of Cubic Boron Nitride Using Ni3Al Solvent under High Pressure

2007 ◽  
Vol 46 (11) ◽  
pp. 7388-7391 ◽  
Author(s):  
Yoichi Kubota ◽  
Kosuke Kosuda ◽  
Takashi Taniguchi
Keyword(s):  
High Pressure ◽  
Boron Nitride ◽  
Cubic Boron Nitride

Ultraviolet light emission from self-organized p–n domains in cubic boron nitride bulk single crystals grown under high pressure

2002 ◽  
Vol 81 (22) ◽  
pp. 4145-4147 ◽  
Author(s):  
T. Taniguchi ◽  
K. Watanabe ◽  
S. Koizumi ◽  
I. Sakaguchi ◽  
T. Sekiguchi ◽  
...  
Keyword(s):  
High Pressure ◽  
Boron Nitride ◽  
Single Crystals ◽  
Ultraviolet Light ◽  
Light Emission ◽  
Cubic Boron Nitride ◽  
Self Organized ◽  
Bulk Single Crystals

Cubic Boron Nitride as a New Semiconductor for Optoelectronics: Luminescence Properties and Potentialities

1989 ◽  
Vol 162 ◽  
Author(s):  
Koh Era ◽  
Osamu Mishima
Keyword(s):  
High Pressure ◽  
High Temperature ◽  
Boron Nitride ◽  
Room Temperature ◽  
Cubic Boron Nitride ◽  
Visible Region ◽  
Vibrational Structure ◽  
Luminescence Properties ◽  
Optoelectronic Applications ◽  
P Type

ABSTRACTIn cubic boron nitride made by high pressure and high temperature technique in our institute, we have found three luminescence bands in the ultraviolet and the short visible region at room temperature by cathode-ray excitation. They are: a band having vibrational structure and ascribable to undoped state of the crystal, a band ascribable to p-type doping and a band ascribable to n-type doping. Discussion is made on differences between the injection luminescence and the cathodoluminescence. Potentialities and difficulties in realizing the potentialities of cBN for optoelectronic applications are discussed.

scholarly journals Production of alumo-matrix composite material modified by nanostructured cubic boron nitride

2018 ◽  
Vol 63 (3) ◽  
pp. 271-279
Author(s):  
P. A. Vityaz ◽  
V. T. Senyut ◽  
M. L. Kheifetz ◽  
A. G. Kolmakov
Keyword(s):  
High Pressure ◽  
Aluminum Alloy ◽  
Boron Nitride ◽  
Cubic Boron Nitride ◽  
Aluminum Matrix ◽  
Treatment Temperature ◽  
Chemical Affinity ◽  
High Temperature Annealing ◽  
High Pressure And Temperature ◽  
Primary Particles

The structure and microhardness of an aluminum alloy with additives of nanostructured cubic boron nitride (cBN) after treatment under high pressure and temperature are investigated. А nanostructured powder of cBN with primary particles within 50–200 nm is used as a filler. A preliminary chemical-thermal modifying of the nanostructured cBN, which consists in its high-temperature annealing in the temperature range of 750–950 °C in a medium of aluminum-contai ning compounds, is carried out to increase the chemical affinity of the nanostructured cBN to the aluminum matrix. It is shown that the modifying of nanostructured cBN with aluminum increases the strength of the additives retention in the aluminum matrix. At the same time the increase in the concentration of BN additives from 1.5 to 5 wt.% as well as the increase in the treatment temperature at a fixed pressure promotes the increase in the microhardness of the material by a factor of 1.5 to 2 as compared with the base aluminum alloy without the addition of a modifier. An increase in the cBN concentration to 5 % by weight results in an increase in the fraction of smaller particle conglomerates (1–5 μm) in the material and in a decrease in the size of large inclusions to 10–20 μm. In this case, the distribution of BN particles in the aluminum matrix is more uniform in comparison with a material with a cBN content of 1.5 wt.%. In the material with the growth of temperature up to 1000 °С, cBN in aggregates is recrystallized with the formation of single-crystal (polycrystalline) particles with the size of 1–10 μm  with faceting specific for cBN micron particles.

Corrosion and Tribological Behaviour of BN Thin Films Deposited Using Magnetron Sputtering

2021 ◽  
Vol 9 (2) ◽  
pp. 24-39
Author(s):  
Mukhtiar Singh ◽  
Hitesh Vasudev ◽  
Ravinder Kumar
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Magnetron Sputtering ◽  
Hexagonal Boron Nitride ◽  
Cubic Boron Nitride ◽  
Base Material ◽  
Electrochemical Corrosion ◽  
Mechanical Analysis ◽  
Tribological Behaviour ◽  
Structural Morphology

Boron nitride coatings were synthesised on 316L stainless steel substrates through the radio frequency magnetron sputtering from a target made of hexagonal boron nitride. The process of deposition was conducted in three separate N2 and Ar system mixing regimes. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) techniques investigated the microstructure morphology and composition of the BN films at varying ratio of N2 and Ar plasma. This research aimed to examine the effects of changing the N2 gas ratio on the structure and structural morphology of c-BN coatings. Using QAr / QN2-5/1 ratios, an increased consistency of the microstructure and further c-BN step formation suggest a fundamental technique for producing superior quality cubic boron nitride films. The electrochemical corrosion test and mechanical analysis was performed to study corrosion and tribological behaviour of the BN coating, and the results showed more improvement in corrosion and tribilogical behaviour in case of BN2 regime. The BN2 regime showed a maximum corrosion resistance of around 1.114 mpy (miles per year). The young's modulus of 346Gpa in magnitude in case of BN2 thin film was found to be higher as compared to base material and other two thin films.

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