scholarly journals Evolution of Cu(In,Ga)Se 2 surfaces under water immersion monitored by X‐ray photoelectron spectroscopy

2020 ◽  
Vol 52 (12) ◽  
pp. 975-979
Author(s):  
Solène Béchu ◽  
Muriel Bouttemy ◽  
Jackie Vigneron ◽  
Daniel Lincot ◽  
Jean‐François Guillemoles ◽  
...  
2011 ◽  
Vol 1298 ◽  
Author(s):  
Catherine A. Dukes ◽  
Raúl A. Baragiola

ABSTRACTMineral samples of varying petrology, exposed to ion irradiation and subsequently immersed in water or exposed to a humid environment, show up to 60% depletion of specific surface atoms (Mg, Ca, K, and Na) — a depletion that is enhanced 26,000x compared to unirradiated surfaces. Surface depletions of irradiated minerals exposed to water were measured using X-ray photoelectron spectroscopy. Irradiations were performed with 4 keV Ar+ ions at fluences from 1014 – 1019 ion cm-2; samples were subsequently exposed to liquid water or humid air (35º C and 70% RH). Analyses were done before irradiation, after irradiation, and after exposure to water, allowing identification of changes in composition due solely to ion irradiation or combined with water exposure. Before water exposure, we observe no significant change in stoichiometry of the minerals for ion fluences <1018 ions cm-2. We find incongruent depletion of 60% Mg for forsterite after exposure to humidity or three minutes (or more) water immersion. Augite undergoes reduction in the surface concentration of approximately 30% Mg, 40% Ca, and 55% Na after 1.9 x 1017 Ar cm-2 and immersion in HPLC water (pH: 6.8) for three minutes. Depth profiles of the irradiated, water exposed, minerals show that the depth of the depleted region is on the order of the ion range, ~15nm. In addition, preliminary results for albite, anorthoclase, and microcline in water show significant depletions of Na, Na and K, and K, respectively, from the mineral surface.


2006 ◽  
Vol 132 ◽  
pp. 87-90
Author(s):  
M. El Kazzi ◽  
G. Delhaye ◽  
S. Gaillard ◽  
E. Bergignat ◽  
G. Hollinger

1987 ◽  
Vol 48 (C9) ◽  
pp. C9-1025-C9-1028 ◽  
Author(s):  
W. ZAHOROWSKI ◽  
A. SIMUNEK ◽  
G. WIECH ◽  
K. SÖLDNER ◽  
R. KNAUF ◽  
...  

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.


2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.


2020 ◽  
Author(s):  
Jennifer A. Rudd ◽  
Ewa Kazimierska ◽  
Louise B. Hamdy ◽  
Odin Bain ◽  
Sunyhik Ahn ◽  
...  

The utilization of carbon dioxide is a major incentive for the growing field of carbon capture. Carbon dioxide could be an abundant building block to generate higher value products. Herein, we describe the use of porous copper electrodes to catalyze the reduction of carbon dioxide into higher value products such as ethylene, ethanol and, notably, propanol. For <i>n</i>-propanol production, faradaic efficiencies reach 4.93% at -0.83 V <i>vs</i> RHE, with a geometric partial current density of -1.85 mA/cm<sup>2</sup>. We have documented the performance of the catalyst in both pristine and urea-modified foams pre- and post-electrolysis. Before electrolysis, the copper electrode consisted of a mixture of cuboctahedra and dendrites. After 35-minute electrolysis, the cuboctahedra and dendrites have undergone structural rearrangement. Changes in the interaction of urea with the catalyst surface have also been observed. These transformations were characterized <i>ex-situ</i> using scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. We found that alterations in the morphology, crystallinity, and surface composition of the catalyst led to the deactivation of the copper foams.


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