Detailed peak fitting analysis of the Zn 2p photoemission spectrum for metallic films and its initial oxidation stages

2017 ◽  
Vol 49 (11) ◽  
pp. 1078-1087 ◽  
Author(s):  
D. Cabrera-German ◽  
G. Molar-Velázquez ◽  
G. Gómez-Sosa ◽  
W. de la Cruz ◽  
A. Herrera-Gomez
Keyword(s):  
Photoemission Spectrum ◽  
Metallic Films ◽  
Initial Oxidation ◽  
Peak Fitting

Small Angle Electron Scattering From Vacuum Condensed Metallic Films

1968 ◽  
Vol 26 ◽  
pp. 380-381
Author(s):  
J. Silcox ◽  
R. H. Wade
Keyword(s):  
Electron Scattering ◽  
Small Angle ◽  
Ring Structure ◽  
Two Dimensional ◽  
Metallic Films ◽  
Micro Structure ◽  
Angle Scattering ◽  
The Fourier Transform ◽  
Source Of Information ◽  
Kinematical Theory

Recent work has drawn attention to the possibilities that small angle electron scattering offers as a source of information about the micro-structure of vacuum condensed films. In particular, this serves as a good detector of discontinuities within the films. A review of a kinematical theory describing the small angle scattering from a thin film composed of discrete particles packed close together will be presented. Such a model could be represented by a set of cylinders packed side by side in a two dimensional fluid-like array, the axis of the cylinders being normal to the film and the length of the cylinders becoming the thickness of the film. The Fourier transform of such an array can be regarded as a ring structure around the central beam in the plane of the film with the usual thickness transform in a direction normal to the film. The intensity profile across the ring structure is related to the radial distribution function of the spacing between cylinders.

High-resolution electron microscopy of Cu2O surfaces

1986 ◽  
Vol 44 ◽  
pp. 396-397
Author(s):  
V. Castano ◽  
W. Krakow
Keyword(s):  
High Resolution ◽  
Natural Extension ◽  
High Resolution Electron Microscopy ◽  
Point Of View ◽  
Initial Oxidation ◽  
System A ◽  
Resolution Electron ◽  
Surface Reconstructions ◽  
Atomic Surface ◽  
Au Thin Films

In non-UHV microscope environments atomic surface structure has been observed for flat-on for various orientations of Au thin films and edge-on for columns of atoms in small particles. The problem of oxidation of surfaces has only recently been reported from the point of view of high resolution microscopy revealing surface reconstructions for the Ag2O system. A natural extension of these initial oxidation studies is to explore other materials areas which are technologically more significant such as that of Cu2O, which will now be described.

Search for quantum size effects in ultrathin epitaxial metallic films

1991 ◽  
Vol 16 (6) ◽  
pp. 623-638 ◽  
Author(s):  
P.A. Badoz ◽  
F. Arnaud d'Avitaya ◽  
E. Rosencher
Keyword(s):  
Size Effects ◽  
Quantum Size Effects ◽  
Metallic Films ◽  
Quantum Size

Metal-Assisted Plasma Etching of Silicon: A Liquid-Free Alternative to MACE

2018 ◽  
Author(s):  
Julia Sun ◽  
Benjamin Almquist
Keyword(s):  
Liquid Phase ◽  
Plasma Etching ◽  
Chemical Etching ◽  
Gold Films ◽  
Metallic Films ◽  
Au Catalyst ◽  
Feed Concentration ◽  
Catalytic Activities ◽  
Metal Assisted Chemical Etching ◽  
Complex Nanostructures

For decades, fabrication of semiconductor devices has utilized well-established etching techniques to create complex nanostructures in silicon. Of these, two of the most common are reactive ion etching in the gaseous phase and metal-assisted chemical etching (MACE) in the liquid phase. Though these two methods are highly established and characterized, there is a surprising scarcity of reports exploring the ability of metallic films to catalytically enhance the etching of silicon in dry plasmas via a MACE-like mechanism. Here, we discuss a <u>m</u>etal-<u>a</u>ssisted <u>p</u>lasma <u>e</u>tch (MAPE) performed using patterned gold films to catalyze the etching of silicon in an SF<sub>6</sub>/O<sub>2</sub> mixed plasma, selectively increasing the rate of etching by over 1000%. The degree of enhancement as a function of Au catalyst configuration and relative oxygen feed concentration is characterized, along with the catalytic activities of other common MACE metals including Ag, Pt, and Cu. Finally, methods of controlling the etch process are briefly explored to demonstrate the potential for use as a liquid-free fabrication strategy.

Stress in Evaporated Metallic Films

Shinku ◽  
1963 ◽  
Vol 6 (5) ◽  
pp. 182-188
Author(s):  
Hisashi HORIKOSHI ◽  
Noriko TAMURA
Keyword(s):  
Metallic Films

Initial Oxidation of a Third-Generation Ni-Based Superalloy Analyzed by in situ Environmental TEM

2019 ◽  
Author(s):  
Yadi Zhai ◽  
Yunsong Zhao ◽  
Xueqiao Li ◽  
Yanhui Chen ◽  
Qingsong Deng ◽  
...  
Keyword(s):  
Third Generation ◽  
Initial Oxidation ◽  
Environmental Tem

scholarly journals ARPES and STS investigation of Shockley states in thin metallic films and periodic nanostructures

2007 ◽  
Vol 9 (10) ◽  
pp. 391-391 ◽  
Author(s):  
D Malterre ◽  
B Kierren ◽  
Y Fagot-Revurat ◽  
S Pons ◽  
A Tejeda ◽  
...  
Keyword(s):  
Metallic Films ◽  
Periodic Nanostructures

scholarly journals Oxidation behavior of non-stoichiometric (Zr,Hf,Ti)Cx carbide solid solution powders in air

2021 ◽  
Author(s):  
Huilin Lun ◽  
Yi Zeng ◽  
Xiang Xiong ◽  
Ziming Ye ◽  
Zhongwei Zhang ◽  
...  
Keyword(s):  
Solid Solution ◽  
Oxidation Resistance ◽  
Oxidation Behavior ◽  
Group Iv ◽  
Hypersonic Vehicles ◽  
Metal Carbides ◽  
Initial Oxidation ◽  
Plasma Sintering ◽  
Spark Plasma ◽  
Kinetics Of

AbstractMulti-component solid solutions with non-stoichiometric compositions are characteristics of ultra-high temperature carbides as promising materials for hypersonic vehicles. However, for group IV transition-metal carbides, the oxidation behavior of multi-component non-stoichiometric (Zr,Hf,Ti)Cx carbide solid solution has not been clarified yet. The present work fabricated four kinds of (Zr,Hf,Ti)Cx carbide solid solution powders by free-pressureless spark plasma sintering to investigate the oxidation behavior of (Zr,Hf,Ti)Cx in air. The effects of metallic atom composition on oxidation resistance were examined. The results indicate that the oxidation kinetics of (Zr,Hf,Ti)Cx are composition dependent. A high Hf content in (Zr,Hf,Ti)Cx was beneficial to form an amorphous Zr-Hf-Ti-C-O oxycarbide layer as an oxygen barrier to enhance the initial oxidation resistance. Meanwhile, an equiatomic ratio of metallic atoms reduced the growth rate of (Zr,Hf,Ti)O2 oxide, increasing its phase stability at high temperatures, which improved the oxidation activation energy of (Zr, Hf, Ti)Cx.

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