Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

2016 ◽  
Vol 49 (6) ◽  
pp. 548-553 ◽  
Author(s):  
Z. A. Umar ◽  
R. S. Rawat ◽  
R. Ahmad ◽  
Z. Chen ◽  
Z. Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Plasma Focus ◽  
Carbon Nitride ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
Hydrogenated Amorphous Carbon ◽  
Amorphous Carbon Nitride ◽  
Hydrogenated Amorphous

Influence of Nitrogen on Hydrogenated Amorphous Carbon Thin Films Deposited by Plasma Focus Device

2018 ◽  
Vol 37 (2-3) ◽  
pp. 95-102 ◽  
Author(s):  
A. Ghorbani ◽  
A. Sadighzadeh ◽  
M. Seifi ◽  
S. M. Sadat Kiai ◽  
A. Raeisdana
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Plasma Focus ◽  
Plasma Focus Device ◽  
Hydrogenated Amorphous Carbon ◽  
Carbon Thin Films ◽  
Hydrogenated Amorphous

Characterization of hydrogenated amorphous carbon nitride particles and coatings obtained in a CH4/N2 radiofrequency discharge

2005 ◽  
Vol 482 (1-2) ◽  
pp. 226-231 ◽  
Author(s):  
Jérémy Pereira ◽  
Isabelle Géraud-Grenier ◽  
Véronique Massereau-Guilbaud ◽  
André Plain
Keyword(s):  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Hydrogenated Amorphous Carbon ◽  
Radiofrequency Discharge ◽  
Amorphous Carbon Nitride ◽  
Hydrogenated Amorphous
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