Formation of alumina films with nano-dot structures by successive liquid phase deposition, anodizing, and substrate dissolution

2013 ◽  
Vol 45 (10) ◽  
pp. 1510-1516 ◽  
Author(s):  
M. Sakairi ◽  
R. Fujita ◽  
H. Jha ◽  
T. Kikuchi
Keyword(s):  
Liquid Phase ◽  
Liquid Phase Deposition ◽  
Alumina Films ◽  
Substrate Dissolution

Silica and Alumina Thin Films Grown by Liquid Phase Deposition

2005 ◽  
Vol 475-479 ◽  
pp. 1725-1728 ◽  
Author(s):  
Jie Sun ◽  
Lizhong Hu ◽  
Zhaoyang Wang ◽  
Guotong Du
Keyword(s):  
Thin Films ◽  
Liquid Phase ◽  
Room Temperature ◽  
Liquid Phase Deposition ◽  
Alumina Films ◽  
Condition Optimization ◽  
Gaas Films ◽  
Al2o3 Films

This work demonstrates the condition optimization during liquid phase deposition (LPD) of SiO2/GaAs films. LPD method is further applied to form Al2O3 films on semiconductors with poison-free materials. Proceeding at room temperature with inexpensive equipment, LPD of silica and alumina films is potentially serviceable in microelectronics and related spheres.

Photoelectrochemical Properties of Anatase TiO2 Films Prepared by Improved Liquid Phase Deposition

2015 ◽  
Vol 1120-1121 ◽  
pp. 419-423
Author(s):  
Cai Xia Lei ◽  
X.L. Jiang ◽  
Y. Liu ◽  
X. Liu ◽  
Y.T. Ma ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Liquid Phase ◽  
Scanning Electron Microscope ◽  
Reaction Temperature ◽  
White Light ◽  
Photoelectrochemical Properties ◽  
Liquid Phase Deposition ◽  
X Ray ◽  
Good Crystallinity ◽  
Scanning Electron

In this paper, the hydrothermal-assisted liquid phase deposition (HT-LPD) method has been developed to prepare TiO2 films. The crystalline structures and morphologies of as-prepared TiO2 films were analyzed using an X-ray diffractometer (XRD) and scanning electron microscope (SEM). It was found that the HT-LPD TiO2 film showed good crystallinity with preferrred orientation along c-axis. Moreover, the as-prepared TiO2 films consisted of two layers, with the tiny nanoparticles as the underlying layer and the flower-like clusters as the upper layer. The photoelectrochemical measurements revealed that, when illuminated by the white light, the HT-LPD TiO2 films exhibited a more negative photopotential value and an increased photocurrent value with elevated reaction temperature, excepting for the sample prerared at 150 °C. In summary, the TiO2 films prepared by the improved LPD method could be served as the promising photoanode for the photoelectrochemical applications.

SrTiO3 Functional Ceramics Thin Film Prepared by Self-Assembled Monolayers with the Liquid Phase Deposition Method on Silicon Substrates

2010 ◽  
Vol 105-106 ◽  
pp. 270-273
Author(s):  
Hui Jun Ren ◽  
Guo Qiang Tan ◽  
Hong Yan Miao ◽  
Ya Yu Song ◽  
Ao Xia
Keyword(s):  
Thin Film ◽  
Contact Angle ◽  
Liquid Phase ◽  
Deposition Temperature ◽  
Precursor Solution ◽  
Self Assembled Monolayers ◽  
Silicon Substrates ◽  
Liquid Phase Deposition ◽  
Assembled Monolayers ◽  
Surface Contact Angle

In this article, (NH4)2TiF6, SrNO3 and H3BO3 were used as raw materials to prepare the precursor solution with the ratio of AHFT/SN/BA=1:1:3. The thin films of SrTiO3 were fabricated on the functional silicon substrates (100) by self-assembled monolayers (SAMs) with the liquid phase deposition (LPD). This article also studied the effects of wet state and the deposition temperature of the precursor solution before and after the functionalization of silicon substrate on the thin film growth. The results indicated that after the immersion in OTS for 30min, the surface contact angle of the silicon substrate changed from 24.64° to 100.91°. The substrate appeared hydrophobic property and it was irradiated by UV light for 30min. Then the surface contact angle of the substrate decreased to 5.00°. The substrate appeared hydrophilicity. The concentration of the precursor solution was 0.025 mol/L, the deposition temperature was 40°C and the deposition time was 9h, which were all helpful to SrTiO3 crystallization. XRD and SEM were used to characterize the physical phase of thin film and surface morphology at 600 °C with annealing and heat retaining for 2h. The results indicated that the thin film prepared by the mono-crystal Si substrate was SrTiO3 thin film with better crystalline. On the crystal surfaces of (110), (100), (200) and (211), there appeared the obvious diffraction peaks. The SrTiO3 grains on the surface had the clear outline and were regular and long columnar crystals.

Liquid phase deposition of iron and cobalt doped TiO2 epitaxial thin films

2008 ◽  
Vol 205 (10) ◽  
pp. 2405-2408 ◽  
Author(s):  
K. Y. S. Chan ◽  
G. K. L. Goh ◽  
M. Y. Han
Keyword(s):  
Thin Films ◽  
Liquid Phase ◽  
Epitaxial Thin Films ◽  
Liquid Phase Deposition ◽  
Doped Tio2

Properties of double-layer Al2O3/TiO2 antireflection coatings by liquid phase deposition

2015 ◽  
Vol 584 ◽  
pp. 248-252 ◽  
Author(s):  
Dong-Sing Wuu ◽  
Che-Chun Lin ◽  
Chao-Nan Chen ◽  
Hong-Hsiu Lee ◽  
Jung-Jie Huang
Keyword(s):  
Liquid Phase ◽  
Double Layer ◽  
Liquid Phase Deposition ◽  
Antireflection Coatings

Breakthrough of Sublimation Drying by Liquid Phase Deposition

2021 ◽  
Vol 314 ◽  
pp. 172-177
Author(s):  
Yuta Sasaki ◽  
Yousuke Hanawa ◽  
Masayuki Otsuji ◽  
Naozumi Fujiwara ◽  
Masahiko Kato ◽  
...  
Keyword(s):  
Free Energy ◽  
Liquid Phase ◽  
Film Thickness ◽  
Process Parameters ◽  
Interfacial Free Energy ◽  
The Other ◽  
Liquid Phase Deposition ◽  
Drying Method ◽  
Substrate Side ◽  
Drying Technology

Damage-free drying becomes increasingly difficult with the scaling of semiconductor devices. In this work, we studied a new sublimation drying technology for 3nm node and beyond. In order to investigate the collapse factor by conventional sublimation drying, we observed the pattern with cryo-SEM and revealed that the collapse occurred when the liquid film on the substrate solidified. Based on this result, we considered that it was important to deposit a solidified film uniformly from the substrate side to suppress collapse. Two key process parameters were evaluated to achieve the uniform formation of the solidified film. One is interfacial free energy and the other is film thickness of solution just before solidification. By optimizing two key parameters, it was successfully demonstrated to suppress pattern collapse of challenging devices. In this paper, we report on a new drying method: sublimation drying by LPD (Liquid-phase deposition).

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