The chemistry and thermal stability of HfTaO/Si interface by x-ray photoelectron spectroscopy

2011 ◽  
Vol 44 (4) ◽  
pp. 395-398 ◽  
Author(s):  
T. Yu ◽  
C. G. Jin ◽  
X. M. Yang ◽  
X. M. Wu ◽  
L. J. Zhuge ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Thermal Stability Of

scholarly journals Improvement of the thermal stability of dendritic silver-coated copper microparticles by surface modification based on molecular self-assembly

2021 ◽  
Vol 8 (1) ◽  
Author(s):  
Tae Hyeong Kim ◽  
Hyeji Kim ◽  
Hyo Jun Jang ◽  
Nara Lee ◽  
Kwang Hyun Nam ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Photoelectron Spectroscopy ◽  
Self Assembly ◽  
Electrically Conductive ◽  
X Ray ◽  
Alkyl Chains ◽  
Conductive Film ◽  
Initial Resistance ◽  
Thermal Stability Of ◽  
Scanning Electron

AbstractIn the study reported herein, silver-coated copper (Ag/Cu) powder was modified with alkanethiols featuring alkyl chains of different lengths, namely butyl, octyl, and dodecyl, to improve its thermal stability. The modification of the Ag/Cu powders with adsorbed alkanethiols was confirmed by scanning electron microscopy with energy dispersive spectroscopy, X-ray photoelectron spectroscopy, and thermogravimetric analysis. Each powder was combined with an epoxy resin to prepare an electrically conductive film. The results confirmed that the thermal stability of the films containing alkanethiol-modified Ag/Cu powders is superior to that of the film containing untreated Ag/Cu powder. The longer the alkyl group in the alkanethiol-modified Ag/Cu powder, the higher the initial resistance of the corresponding electrically conductive film and the lower the increase in resistance induced by heat treatment.

scholarly journals Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO2

Nanomaterials ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 210
Author(s):  
Xiangdong Yang ◽  
Haitao Wang ◽  
Peng Wang ◽  
Xuxin Yang ◽  
Hongying Mao
Keyword(s):  
Thermal Stability ◽  
Thermal Behavior ◽  
Work Function ◽  
Photoelectron Spectroscopy ◽  
Vacuum Annealing ◽  
Moderate Temperature ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
X Ray ◽  
Thermal Stability Of

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K.

Thermal stability of magnetic tunnel junctions studied by x-ray photoelectron spectroscopy

2001 ◽  
Vol 78 (2) ◽  
pp. 234-236 ◽  
Author(s):  
David J. Keavney ◽  
Sungkyun Park ◽  
Charles M. Falco ◽  
J. M. Slaughter
Keyword(s):  
Thermal Stability ◽  
Photoelectron Spectroscopy ◽  
Tunnel Junctions ◽  
Magnetic Tunnel Junctions ◽  
X Ray ◽  
Thermal Stability Of

Thermal stability of carbon nitride thin films

2001 ◽  
Vol 16 (11) ◽  
pp. 3188-3201 ◽  
Author(s):  
Niklas Hellgren ◽  
Nian Lin ◽  
Esteban Broitman ◽  
Virginie Serin ◽  
Stefano E. Grillo ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Thermal Stability ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Amorphous Structure ◽  
X Ray ◽  
Bonding Structure ◽  
Higher Temperature ◽  
Electron Energy Loss ◽  
Thermal Stability Of

The thermal stability of carbon nitride films, deposited by reactive direct current magnetron sputtering in N2 discharge, was studied for postdeposition annealing temperatures TA up to 1000 °C. Films were grown at temperatures of 100 °C (amorphous structure) and 350 and 550 °C (fullerenelike structure) and were analyzed with respect to thickness, composition, microstructure, bonding structure, and mechanical properties as a function of TA and annealing time. All properties investigated were found to be stable for annealing up to 300 °C for long times (>48 h). For higher TA, nitrogen is lost from the films and graphitization takes place. At TA = 500 °C the graphitization process takes up to 48 h while at TA = 900 °C it takes less than 2 min. A comparison on the evolution of x-ray photoelectron spectroscopy, electron energy loss spectroscopy and Raman spectra during annealing shows that for TA > 800 °C, preferentially pyridinelike N and –C≡N is lost from the films, mainly in the form of molecular N2 and C2N2, while N substituted in graphite is preserved the longest in the structure. Films deposited at the higher temperature exhibit better thermal stability, but annealing at temperatures a few hundred degrees Celsius above the deposition temperature for long times is always detrimental for the mechanical properties of the films.

scholarly journals Effect of Annealing, Stoichiometry, and Surface on Magnetism of (Pr,Dy)FeCoB Microparticles Ensemble

2017 ◽  
Vol 62 (3) ◽  
pp. 1923-1930 ◽  
Author(s):  
E.N. Kablov ◽  
O.G. Ospennikova ◽  
E.I. Kunitsyna ◽  
V.P. Piskorskii ◽  
D.V. Korolev ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Magnetic Properties ◽  
Phase Composition ◽  
Photoelectron Spectroscopy ◽  
Surface States ◽  
Anisotropy Field ◽  
X Ray ◽  
Average Size ◽  
Thermal Stability Of ◽  
Effect Of Surface

AbstractMagnetic properties of powder (Pr,Dy)FeCoB ferrimagnetic alloys and effects of annealing, surface states were analyzed. X-ray photoelectron spectroscopy and Mössbauer spectra of powders indicate the effect of surface states on phase composition and magnetic properties of the studied powder, if particles average size is smaller than 10 μm. Effect of stoichiometry on magnetic anisotropy was found. Thermal stability of anisotropy field was proved by replacement of Fe atoms with Co atoms.

Sign in / Sign up

Export Citation Format

Share Document