Infrared spectroscopic ellipsometry (IRSE) and X-ray photoelectron spectroscopy (XPS) monitoring the preparation of maleimide-functionalized surfaces: from Au towards Si (111)

2010 ◽  
Vol 43 (9) ◽  
pp. 1203-1210 ◽  
Author(s):  
Guoguang Sun ◽  
Marc Hovestädt ◽  
Xin Zhang ◽  
Karsten Hinrichs ◽  
Dana Maria Rosu ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Functionalized Surfaces ◽  
Infrared Spectroscopic

scholarly journals Oxidation of aluminum thin films protected by ultrathin MgF2 layers measured using spectroscopic ellipsometry and X-ray photoelectron spectroscopy

OSA Continuum ◽  
2021 ◽  
Vol 4 (3) ◽  
pp. 879
Author(s):  
Brian I. Johnson ◽  
Tahereh G. Avval ◽  
R. Steven Turley ◽  
Matthew R. Linford ◽  
David D. Allred
Keyword(s):  
Thin Films ◽  
Spectroscopic Ellipsometry ◽  
Photoelectron Spectroscopy ◽  
X Ray

Effect of Cleaning Chemistries on Cobalt: Surface Chemistries and Electrical Characterization

2018 ◽  
Vol 282 ◽  
pp. 263-267
Author(s):  
Quoc Toan Le ◽  
Els Kesters ◽  
Yuya Akanishi ◽  
Marleen H. van der Veen ◽  
Atsushi Mizutani ◽  
...  
Keyword(s):  
Dissolved Oxygen ◽  
Spectroscopic Ellipsometry ◽  
Photoelectron Spectroscopy ◽  
Good Yield ◽  
Electrical Characterization ◽  
Cobalt Hydroxide ◽  
Dissolved Oxygen Concentration ◽  
X Ray ◽  
Xps Characterization ◽  
Surface Chemistries

The etching characteristics of ECD cobalt in different cleaning solutions were characterized using four-point probe, spectroscopic ellipsometry, and X-ray photoelectron spectroscopy. 0.05% HF solution with saturated dissolved oxygen concentration was found to result in a substantial etch of ECD cobalt (~5 nm/min). In contrast, cleaning in the SC1 1:4:100 mixture and the formulated mixture led to a significantly lower etch amount, which could be explained by the formation of a passivation layer at the surface. XPS characterization indicated the formation of a cobalt hydroxide at the surface. The electrical evaluation of the DD structure carried out after cleaning using the formulated chemical mixture and subsequent metallization showed good yield for the 22 nm Kelvin vias, testifying an efficient cleaning of the Co surface at the via bottom.

Combined characterization of conductive materials by infrared spectroscopic ellipsometry and grazing X-ray reflectance

1998 ◽  
Vol 319 (1-2) ◽  
pp. 67-72 ◽  
Author(s):  
Pierre Boher ◽  
Michel Luttmann ◽  
Jean Louis Stehle ◽  
Louis Hennet
Keyword(s):  
Spectroscopic Ellipsometry ◽  
X Ray ◽  
Conductive Materials ◽  
Infrared Spectroscopic
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