Determination of the relative sputtering yield of carbon to tantalum by means of Auger electron spectroscopy depth profiling

L. Kotis; M. Menyhard; A. Sulyok; G. Sáfrán; A. Zalar; J. Kovač; P. Panjan

doi:10.1002/sia.3101

Determination of the relative sputtering yield of carbon to tantalum by means of Auger electron spectroscopy depth profiling

Surface and Interface Analysis ◽

10.1002/sia.3101 ◽

2009 ◽

Vol 41 (10) ◽

pp. 799-803 ◽

Cited By ~ 9

Author(s):

L. Kotis ◽

M. Menyhard ◽

A. Sulyok ◽

G. Sáfrán ◽

A. Zalar ◽

...

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Auger Electron Spectroscopy Depth ◽

Sputtering Yield

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Determination of the thickness distribution of a graphene layer grown on a 2″ SiC wafer by means of Auger electron spectroscopy depth profiling

Applied Surface Science ◽

10.1016/j.apsusc.2014.08.019 ◽

2014 ◽

Vol 316 ◽

pp. 301-307 ◽

Cited By ~ 4

Author(s):

L. Kotis ◽

S. Gurban ◽

B. Pecz ◽

M. Menyhard ◽

R. Yakimova

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Graphene Layer ◽

Thickness Distribution ◽

Depth Profiling ◽

Auger Electron Spectroscopy Depth ◽

Sic Wafer

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Determination of the depth resolution of Auger electron spectroscopy depth profiles of anodic barrier oxide films on differently pretreated aluminium substrates

Surface and Interface Analysis ◽

10.1002/sia.740220139 ◽

1994 ◽

Vol 22 (1-12) ◽

pp. 175-180 ◽

Cited By ~ 8

Author(s):

J. De Laet ◽

K. De Boeck ◽

H. Terryn ◽

J. Vereecken

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Films ◽

Depth Resolution ◽

Depth Profiles ◽

Auger Electron Spectroscopy Depth

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Sample rotating in Auger electron spectroscopy depth profiling

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574242 ◽

1987 ◽

Vol 5 (5) ◽

pp. 2979-2980 ◽

Cited By ~ 10

Author(s):

A. Zalar

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Auger Electron Spectroscopy Depth

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Auger electron spectroscopy depth profiling during sample rotation

Surface and Interface Analysis ◽

10.1002/sia.740090108 ◽

1986 ◽

Vol 9 (1) ◽

pp. 41-46 ◽

Cited By ~ 52

Author(s):

A. Zalar

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Sample Rotation ◽

Auger Electron Spectroscopy Depth

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Study of ion mixing during Auger electron spectroscopy depth profiling of Ge–Si multilayer system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579216 ◽

1994 ◽

Vol 12 (4) ◽

pp. 2368-2372 ◽

Cited By ~ 7

Author(s):

M. Menyhard ◽

A. Barna ◽

J. P. Biersack

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Multilayer System ◽

Auger Electron Spectroscopy Depth

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Improved depth resolution by sample rotation during Auger electron spectroscopy depth profiling

Thin Solid Films ◽

10.1016/0040-6090(85)90269-x ◽

1985 ◽

Vol 124 (3-4) ◽

pp. 223-230 ◽

Cited By ~ 212

Author(s):

A Zalar

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Depth Resolution ◽

Sample Rotation ◽

Auger Electron Spectroscopy Depth

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Auger electron spectroscopy depth profiling of silicon long-term wall samples exposed in the Tokamak de Varennes

Journal of Nuclear Materials ◽

10.1016/0022-3115(91)90435-a ◽

1991 ◽

Vol 182 ◽

pp. 247-253 ◽

Cited By ~ 1

Author(s):

R.W. Paynter ◽

C. Boucher ◽

B. Terreault ◽

D. Thériault

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Auger Electron Spectroscopy Depth

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Intermixing in Cu/Co: Molecular Dynamics Simulations and Auger Electron Spectroscopy Depth Profiling

Defect and Diffusion Forum ◽

10.4028/www.scientific.net/ddf.264.19 ◽

2007 ◽

Vol 264 ◽

pp. 19-26 ◽

Cited By ~ 3

Author(s):

Péter Süle ◽

Miklós Menyhárd

Keyword(s):

Molecular Dynamics ◽

Auger Electron Spectroscopy ◽

Molecular Dynamics Simulations ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Auger Electron Spectroscopy Depth ◽

Dynamics Simulations

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Quantitative analysis of Cu implanted Co/Ni alloys by Auger electron spectroscopy/depth profiling using factor analysis

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575625 ◽

1988 ◽

Vol 6 (3) ◽

pp. 1027-1031 ◽

Cited By ~ 8

Author(s):

J. H. Wandass ◽

N. H. Turner

Keyword(s):

Factor Analysis ◽

Quantitative Analysis ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Ni Alloys ◽

Auger Electron Spectroscopy Depth

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Factors causing deterioration of depth resolution in Auger electron spectroscopy depth profiling of multilayered systems

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580877 ◽

1997 ◽

Vol 15 (3) ◽

pp. 478-484 ◽

Cited By ~ 11

Author(s):

K. Satori ◽

Y. Haga ◽

R. Minatoya ◽

M. Aoki ◽

K. Kajiwara

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Depth Profiling ◽

Depth Resolution ◽

Auger Electron Spectroscopy Depth ◽

Multilayered Systems

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