Ultimate sized nano-dots formed by electron beam-induced deposition using an ultrahigh vacuum transmission electron microscope

2005 ◽  
Vol 37 (2) ◽  
pp. 261-264 ◽  
Author(s):  
M. Tanaka ◽  
M. Shimojo ◽  
M. Han ◽  
K. Mitsuishi ◽  
K. Furuya
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Ultrahigh Vacuum ◽  
Transmission Electron ◽  
Electron Beam Induced Deposition

Crystallization under 1 MeV Electron Beam Irradiation of Nanometer-Sized W-Dendrites Fabricated on Alumina Substrates with Electron-Beam-Induced Deposition

2005 ◽  
Vol 475-479 ◽  
pp. 4035-4038 ◽  
Author(s):  
Ming Hui Song ◽  
Kazutaka Mitsuishi ◽  
Kazuo Furuya
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Electron Beam Irradiation ◽  
Transmission Electron ◽  
Electron Beam Induced Deposition ◽  
Dendritic Form ◽  
Almost All ◽  
Induced Crystallization ◽  
Amorphous Part

Nanometer-sized W-dendritic form structure was fabricated with electron-beam-induced deposition (EBID) in a 200 kV transmission electron microscope. The as-prepared nanodendrites are composed of W-nanocrystals and amorphous. The as-prepared nanodendrites were then irradiated with 1 MeV electron beam in a high voltage transmission electron microscope. The effect of the irradiation is investigated. The irradiation transformed effectively almost all the amorphous part to crystalline state. Morphology of the nanodendrite also changes. The irradiation induced crystallization and morphology change are discussed.

Nanofabrication of Tungsten Structure by Electron-Beam-Induced Deposition in Scanning Transmission Electron Microscope

2004 ◽  
Vol 10 (S02) ◽  
pp. 566-567
Author(s):  
Z.Q. Liu ◽  
K. Mitsuishi ◽  
K. Furuya
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Scanning Transmission Electron Microscope ◽  
Scanning Transmission Electron ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
Electron Beam Induced Deposition

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Aspects of microanalysis in a transmission electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 510-511
Author(s):  
R. Sinclair ◽  
B.E. Jacobson
Keyword(s):  
Grain Size ◽  
Electron Beam ◽  
Electron Microscope ◽  
Chemical Analysis ◽  
Transmission Electron Microscope ◽  
Vapor Deposition ◽  
Critical Currents ◽  
X Ray ◽  
Fine Grain ◽  
Transmission Electron

INTRODUCTIONThe prospect of performing chemical analysis of thin specimens at any desired level of resolution is particularly appealing to the materials scientist. Commercial TEM-based systems are now available which virtually provide this capability. The purpose of this contribution is to illustrate its application to problems which would have been intractable until recently, pointing out some current limitations.X-RAY ANALYSISIn an attempt to fabricate superconducting materials with high critical currents and temperature, thin Nb3Sn films have been prepared by electron beam vapor deposition [1]. Fine-grain size material is desirable which may be achieved by codeposition with small amounts of Al2O3 . Figure 1 shows the STEM microstructure, with large (∽ 200 Å dia) voids present at the grain boundaries. Higher quality TEM micrographs (e.g. fig. 2) reveal the presence of small voids within the grains which are absent in pure Nb3Sn prepared under identical conditions. The X-ray spectrum from large (∽ lμ dia) or small (∽100 Ǻ dia) areas within the grains indicates only small amounts of A1 (fig.3).

Electron beam dynamics in an ultrafast transmission electron microscope with Wehnelt electrode

2016 ◽  
Vol 171 ◽  
pp. 8-18 ◽  
Author(s):  
K. Bücker ◽  
M. Picher ◽  
O. Crégut ◽  
T. LaGrange ◽  
B.W. Reed ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Beam Dynamics ◽  
Transmission Electron ◽  
Electron Beam Dynamics
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