In situ analysis using synchrotron radiation photoemission spectroscopy for initial oxidation of oxygen preadsorbed Si(001) surfaces induced by supersonic O2 molecular beams

2002 ◽  
Vol 34 (1) ◽  
pp. 432-436 ◽  
Author(s):  
Akitaka Yoshigoe ◽  
Yuden Teraoka
Keyword(s):  
Synchrotron Radiation ◽  
Molecular Beams ◽  
In Situ Analysis ◽  
Photoemission Spectroscopy ◽  
Initial Oxidation ◽  
Synchrotron Radiation Photoemission

The research of CdZnTe (111)B surface with synchrotron radiation photoemission spectroscopy

2009 ◽  
Vol 24 (5) ◽  
pp. 1639-1641 ◽  
Author(s):  
Gangqiang Zha ◽  
Wanqi Jie ◽  
Tingting Tan ◽  
XuXu Bai ◽  
Li Fu ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Work Function ◽  
Photoemission Spectroscopy ◽  
Low Energy Electron Diffraction ◽  
Local Reconstruction ◽  
Atomic Structures ◽  
Low Energy Electron ◽  
Synchrotron Radiation Photoemission ◽  
The Ideal

The clean and ordered surfaces of CdZnTe (111)B grown by the Bridgman method were obtained by Ar ion bombardment and thermal annealing in situ in an ultrahigh vacuum. The surface atomic structures of CdZnTe (111)B after annealing at different temperature were observed by low-energy electron diffraction (LEED). The valence band and work function of CdZnTe (111)B surfaces were determined by synchrotron radiation photoemission spectroscopy. The order of CdZnTe (111)B after annealing at 350 °C will worsen, and the (111)B-(2 × 2) local reconstruction will be formed. The work function of CdZnTe (111)B after annealing at 350 °C is 0.8 eV higher than that of CdZnTe (111)B-(1 × 1), and the local reconstruction may be induced by Te adatoms on top of the ideal truncation.

scholarly journals Activation of Zr, ZrVHf and TiZrV Non-Evaporative Getters Characterized by In Situ Synchrotron Radiation Photoemission Spectroscopy

2021 ◽  
Vol 11 (11) ◽  
pp. 4844
Author(s):  
Yuchen Yang ◽  
Yongsheng Ma ◽  
Jia’ou Wang ◽  
Tao Huang ◽  
Baiqi Liu ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Grain Boundary ◽  
Heating Temperature ◽  
Photoemission Spectroscopy ◽  
Activation Process ◽  
Activation Temperature ◽  
Grain Boundary Precipitation ◽  
Synchrotron Radiation Photoemission ◽  
Reduction Of Oxides

The activation process of Zr, ZrVHf and TiZrV non-evaporative getter (NEG) thin films, prepared by direct current magnetron sputtering, is investigated by in situ synchrotron radiation photoemission spectroscopy. The activation temperatures of Zr and ZrVHf films are found to be 300 °C and 200 °C, respectively, and the activation temperature of TiZrV film is 120 °C—the lowest activation temperature reported on TiZrV. As the heating temperature increases, the transformation of metal-C bond follows the orders of V–C, Ti–C, Zr–C, Hf–C. It is found that the order of reduction difficulty of the same element oxides, that is, Zr oxide and V oxide in different films follows Zr film > ZrVHf film > TiZrV film. The order of difficulty in the reduction of oxides in the same alloy NEG films follows HfO2 > ZrO2 > TiO2 > V2O5. We propose that the above phenomena can be explained by interstitial diffusion, grain boundary diffusion of residual gas atoms and grain boundary precipitation of V and Ti in the solid solution of the NEG films.

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