Summary of ISO/TC 201 Technical Report: ISO/TR 15969:2000?Surface chemical analysis?Depth profiling?Measurement of sputtered depth

S. Hofmann

doi:10.1002/sia.1221

Summary of ISO/TC 201 Technical Report: ISO/TR 15969:2000?Surface chemical analysis?Depth profiling?Measurement of sputtered depth

Surface and Interface Analysis ◽

10.1002/sia.1221 ◽

2002 ◽

Vol 33 (5) ◽

pp. 453-454 ◽

Cited By ~ 8

Author(s):

S. Hofmann

Keyword(s):

Chemical Analysis ◽

Depth Profiling ◽

Surface Chemical ◽

Technical Report ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

10.3403/30199170u ◽

2015 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Surface Chemical ◽

Spectrometry Method ◽

Mass Spectrometry Method ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

10.3403/30241147 ◽

2013 ◽

Keyword(s):

Chemical Analysis ◽

Current Density ◽

Ion Beam ◽

Depth Profiling ◽

Surface Chemical ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Technical Report 23173—Surface chemical analysis—Electron spectroscopies—Measurement of the thickness and composition of nanoparticle coatings

Surface and Interface Analysis ◽

10.1002/sia.6987 ◽

2021 ◽

Author(s):

David J. H. Cant ◽

Anja Müller ◽

Charles A. Clifford ◽

Wolfgang E. S. Unger ◽

Alexander G. Shard

Keyword(s):

Chemical Analysis ◽

Surface Chemical ◽

Technical Report ◽

Nanoparticle Coatings ◽

Surface Chemical Analysis

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Summary of ISO/TC201 technical report: ISO/TR 18392: 2005—Surface chemical analysis—X-ray photoelectron spectroscopy—Procedures for determining backgrounds

Surface and Interface Analysis ◽

10.1002/sia.2365 ◽

2006 ◽

Vol 38 (7) ◽

pp. 1173-1175 ◽

Cited By ~ 8

Author(s):

L. Kövér

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Surface Chemical ◽

X Ray ◽

Technical Report ◽

Surface Chemical Analysis

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Current Activities of SC4 Depth Profiling in ISO/TC201 Surface Chemical Analysis

Journal of Surface Analysis ◽

10.1384/jsa.15.243 ◽

2009 ◽

Vol 15 (3) ◽

pp. 243-245

Author(s):

Mineharu Suzuki

Keyword(s):

Chemical Analysis ◽

Depth Profiling ◽

Surface Chemical ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon

10.3403/02631515u ◽

2015 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Surface Chemical ◽

Spectrometry Method ◽

Mass Spectrometry Method ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry

10.3403/30255192u ◽

2015 ◽

Keyword(s):

Glow Discharge ◽

Chemical Analysis ◽

Depth Profiling ◽

Optical Emission ◽

Optical Emission Spectrometry ◽

Emission Spectrometry ◽

Surface Chemical ◽

Compositional Depth Profiling ◽

Surface Chemical Analysis

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Surface chemical analysis. General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry

10.3403/30255192 ◽

2013 ◽

Keyword(s):

Glow Discharge ◽

Chemical Analysis ◽

Depth Profiling ◽

Optical Emission ◽

Optical Emission Spectrometry ◽

Emission Spectrometry ◽

Surface Chemical ◽

Compositional Depth Profiling ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon

10.3403/30296417 ◽

2014 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Surface Chemical ◽

Spectrometry Method ◽

Mass Spectrometry Method ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Technical Report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

Surface and Interface Analysis ◽

10.1002/sia.5294 ◽

2013 ◽

Vol 45 (9) ◽

pp. 1313-1316 ◽

Cited By ~ 11

Author(s):

M. Senoner ◽

W. E. S. Unger

Keyword(s):

Chemical Analysis ◽

Lateral Resolution ◽

Surface Chemical ◽

Technical Report ◽

Surface Chemical Analysis

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