Adhesion activation of Twaron®aramid fibres studied with low-energy ion scattering and x-ray photoelectron spectroscopy

2001 ◽  
Vol 31 (12) ◽  
pp. 1079-1084 ◽  
Author(s):  
P. J. de Lange ◽  
P. G. Akker ◽  
A. J. H. Maas ◽  
A. Knoester ◽  
H. H. Brongersma
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Ion Scattering ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Aramid Fibres

The growth and thermal properties of Au deposited on Rh(111): formation of an ordered surface alloy

2016 ◽  
Vol 18 (36) ◽  
pp. 25230-25240 ◽  
Author(s):  
László Óvári ◽  
András Berkó ◽  
Gábor Vári ◽  
Richárd Gubó ◽  
Arnold Péter Farkas ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Ion Scattering ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Resolution Electron ◽  
Ion Scattering Spectroscopy ◽  
Scanning Tunnelling ◽  
Tunnelling Microscopy ◽  
Electron Energy Loss

Scanning tunnelling microscopy (STM), low energy ion scattering spectroscopy (LEIS), X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS) were applied for studying Au deposited on the Rh(111) surface.

GROWTH AND STRUCTURE OF hcp Ti FILMS ON Al(111) SURFACES

1999 ◽  
Vol 06 (05) ◽  
pp. 775-780 ◽  
Author(s):  
Y. W. KIM ◽  
G. A. WHITE ◽  
N. R. SHIVAPARAN ◽  
M. A. TETER ◽  
R. J. SMITH
Keyword(s):  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Three Dimensional ◽  
High Energy ◽  
Low Energy ◽  
Ion Scattering ◽  
Island Growth ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Ti Films

The structure of thin Ti films grown on Al(111) surfaces at room temperature has been studied using high energy ion scattering/channeling (HEIS), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), low energy electron diffraction (LEED) and X-ray photoelectron diffraction (XPD). Our results show that Ti grows in the SK mode on the Al(111) surface. Ti atoms form a two-dimensional overlayer up to a deposition of about 2 ML Ti, followed by three-dimensional island growth with additional Ti deposition. The Ti islands cover the surface completely at about 12 ML of Ti deposition. XPD results show that the Ti overlayer has a well-ordered hcp Ti(0001) structure on the fcc Al(111) surface, in remarkable contrast to the fcc Ti film growth observed on Al(001) and Al(110) surfaces.

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