P-222L: Kim Late-News Poster: Fabrication of Nitrocellulose based Organic Material as a Gate Dielectric Layer for Oxide Thin Film Transistor

2017 ◽  
Vol 48 (1) ◽  
pp. 1356-1358
Author(s):  
Won-Gi Kim ◽  
Young Jun Tak ◽  
Yeong-gyu Kim ◽  
Jusung Chung ◽  
Byung Ha Kang ◽  
...  
2021 ◽  
Vol 23 (09) ◽  
pp. 1078-1085
Author(s):  
A. Kanni Raj ◽  

Indium Lead Oxide (ILO) based Metal Oxide Thin Film Transistor (MOTFT) is fabricated with Lead Barium Zirconate (PBZ) gate dielectric. PBZ is formed over doped silicon substrate by cheap sol-gel process. Thin film PBZ is analysed with X-ray Diffraction (XRD), Ultra-Violet Visible Spectra (UV-Vis) and Atomic Force Microscope (AFM). IZO is used as bottom gate to contact Thin Film Transistor (TFT). This device needs only 5V as operating voltage, and so is good for lower electronics <40V. It shows excellent emobility 4.5cm2/V/s, with on/off ratio 5×105 and sub-threshold swing 0.35V/decade.


2013 ◽  
Vol 138 (1) ◽  
pp. 1-4 ◽  
Author(s):  
Sungho Choi ◽  
Byung-Yoon Park ◽  
Sunho Jeong ◽  
Ji-Yoon Lee ◽  
Beyong-Hwan Ryu ◽  
...  

2019 ◽  
Vol 16 (1) ◽  
pp. 22-34 ◽  
Author(s):  
Anand Sharma ◽  
Nitesh K. Chourasia ◽  
Vishwas Acharya ◽  
Nila Pal ◽  
Sajal Biring ◽  
...  

2013 ◽  
Vol 16 ◽  
pp. 111-116 ◽  
Author(s):  
M. Cavas ◽  
Ahmed A. Al-Ghamdi ◽  
O.A. Al-Hartomy ◽  
F. El-Tantawy ◽  
F. Yakuphanoglu

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