Partial pressure dependency of17O/16O and18O/16O of molecular oxygen in the mass spectrometer

2003 ◽  
Vol 17 (5) ◽  
pp. 395-400 ◽  
Author(s):  
Osamu Abe ◽  
Naohiro Yoshida
Keyword(s):  
Partial Pressure ◽  
Molecular Oxygen ◽  
Mass Spectrometer ◽  
Pressure Dependency

In Situ Measurement of Nitrogen during Growth of 4H-SiC by CVD

2007 ◽  
Vol 556-557 ◽  
pp. 125-128 ◽  
Author(s):  
Brenda L. VanMil ◽  
Kok Keong Lew ◽  
Rachael L. Myers-Ward ◽  
Ronald T. Holm ◽  
D. Kurt Gaskill ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Real Time ◽  
Mass Spectrometer ◽  
Gas Flow ◽  
Secondary Ion Mass Spectrometry ◽  
Nitrogen Concentration ◽  
Chemical Vapor ◽  
Real Time Analysis ◽  
Process Gas ◽  
Nitrogen Concentrations

Real-time analysis of downstream nitrogen process-gas flows during 4H-SiC growth is reported. A Hiden Analytical HPR-20 quadrupole mass-spectrometer (QMS) was used to measure the process gas composition in the gas-stream of a hot-wall chemical vapor deposition (CVD) reactor. Using the 28 amu peak, it was found that the nitrogen partial pressure measured by the mass spectrometer directly correlates to the expected partial pressure of nitrogen in the process cell based on input flows. Two staircase doping samples were grown to track doping variations. The nitrogen mass flow was varied and corresponded to doping levels ranging from 1x1015 cm-3 to 8x1018 cm-3. Electron and nitrogen concentrations in the epilayers were measured by capacitancevoltage (CV) profiling and secondary ion mass spectrometry (SIMS), respectively. These efforts show real-time QMS monitoring is effective during growth for determining relative changes in nitrogen concentration in the gas flow, and thus, the level of nitrogen incorporation into the growing layer.

Study on the characteristics of quadrupole mass spectrometer by the UHV partial pressure standard

Vacuum ◽  
2021 ◽  
pp. 110357
Author(s):  
Dong Meng ◽  
Sun Wenjun ◽  
Wu Chengyao ◽  
Feng Tianyou ◽  
Ren Zhengyi ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Mass Spectrometer ◽  
Quadrupole Mass Spectrometer ◽  
Quadrupole Mass ◽  
Pressure Standard

scholarly journals Calibration study for quadrupole mass spectrometer with LIP new UHV partial pressure standard

2021 ◽  
Vol 18 ◽  
pp. 100168
Author(s):  
Dong Meng ◽  
Sun Wenjun ◽  
Wu Chengyao ◽  
Feng Tianyou ◽  
Zhang Suzhao ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Mass Spectrometer ◽  
Quadrupole Mass Spectrometer ◽  
Quadrupole Mass ◽  
Pressure Standard ◽  
Calibration Study
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