Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition

2012 ◽  
Vol 9 (3-4) ◽  
pp. 1053-1056 ◽  
Author(s):  
E. Cappelli ◽  
D. M. Trucchi ◽  
S. Orlando ◽  
A. Bellucci ◽  
A. Mezzi ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Electronic Properties ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Process Conditions

Structure and chemical composition of BN thin films grown by pulsed-laser deposition (PLD)

1995 ◽  
Vol 86 (1-4) ◽  
pp. 165-169 ◽  
Author(s):  
T. Klotzbücher ◽  
W. Pfleging ◽  
M. Mertin ◽  
D.A. Wesner ◽  
E.W. Kreutz
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Chemical composition of ZrC thin films grown by pulsed laser deposition

2009 ◽  
Vol 255 (10) ◽  
pp. 5260-5263 ◽  
Author(s):  
D. Craciun ◽  
G. Socol ◽  
N. Stefan ◽  
G. Bourne ◽  
V. Craciun
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Structure and chemical composition of BN thin films grown by pulsed-laser deposition

1995 ◽  
Vol 4 (4) ◽  
pp. 370-374 ◽  
Author(s):  
W. Pfleging ◽  
T. Klotzbücher ◽  
D.A. Wesner ◽  
E.W. Kreutz
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

The effect of deposition atmosphere on the chemical composition of TiN and ZrN thin films grown by pulsed laser deposition

2014 ◽  
Vol 302 ◽  
pp. 124-128 ◽  
Author(s):  
D. Craciun ◽  
G. Socol ◽  
N. Stefan ◽  
G. Dorcioman ◽  
M. Hanna ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

scholarly journals Structural, magnetic, and electronic properties of GdTiO3 Mott insulator thin films grown by pulsed laser deposition

2014 ◽  
Vol 105 (17) ◽  
pp. 172402 ◽  
Author(s):  
M. N. Grisolia ◽  
F. Y. Bruno ◽  
D. Sando ◽  
H. J. Zhao ◽  
E. Jacquet ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Electronic Properties ◽  
Pulsed Laser ◽  
Mott Insulator ◽  
Laser Deposition

Structure and Morphology of Thin Films Deposited by Pulsed Laser Deposition Technique

2012 ◽  
Vol 186 ◽  
pp. 160-163
Author(s):  
Agnieszka Radziszewska
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Pulsed Laser Deposition ◽  
Multilayer Structure ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Nanocrystalline Structure ◽  
Laser Wavelength ◽  
Laser Deposition ◽  
Structure And Morphology

The paper presented the structure (TEM), morphology and chemical composition (EDS) of the -Al-Mg thin films and Al-Mg-Ni multilayer obtained by pulsed laser deposition (PLD). This films were deposited using Nd:YAG laser. The different process parameters were applied. The Al-Mg film was obtained by application of the laser wavelength (=355 nm) and substrate temperature (Ts) 200 oC. Whereas the Al-Mg-Ni multilayer was produced at lower laser wavelength (=266 nm) and at room temperature of the substrate. For preparation of both films the same laser fluence (q=4.7 J/cm2) was used. The Al-Mg possessed nanocrystalline structure with the areas where only columnar Al crystals occurred. EDS of this thin film exhibited that in the nanocrystalline areas the chemical composition corresponded to the target content of Al and Mg. While Al-Mg-Ni multilayer composed of six layers. In this case Al-Mg layers were thinner then Ni layers. In the multilayer structure the fcc Al0.65Mg0.35 and fcc Ni phases was revealed.

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