High bandgap dielectrics for antireflective coating in silicon solar cells by reactive ion sputtering

2011 ◽  
Vol 8 (4) ◽  
pp. 1311-1314 ◽  
Author(s):  
P. M. Kaminski ◽  
K. Bass ◽  
G. Claudio
Coatings ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 721
Author(s):  
Yahia F. Makableh ◽  
Hani Alzubi ◽  
Ghassan Tashtoush

The design and optimization of a nanostructured antireflective coatings for Si solar cells were performed by using response surface methodology (RSM). RSM was employed to investigate the effect on the overall optical performance of silicon solar cells coated with three different nanoparticle materials of titanium dioxide, aluminum oxide, and zinc oxide nanostructures. Central composite design was used for the optimization of the reflectance process and to study the main effects and interactions between the three process variables: nanomaterial type, the radius of nanoparticles, and wavelength of visible light. In this theoretical study, COMSOL Multiphysics was utilized to design the structures by using the wave optics module. The optical properties of the solar cell’s substrate and the three different nanomaterial types were studied. The results indicated that ZnO nanoparticles were the best antireflective coating candidate for Si, as the ZnO nanoparticles produced the lowest reflection values among the three nanomaterial types. The study reveals that the optimum conditions to reach minimum surface reflections for silicon solar cell were established by using ZnO nanoparticles with a radius of ~38 nm. On average, the reflectance reached ~5.5% along the visible spectral range, and approximately zero reflectance in the 550–600 nm range.


2014 ◽  
Author(s):  
S. Zuccon ◽  
P. Zuppella ◽  
A. J. Corso ◽  
M. G. Pelizzo

1982 ◽  
Vol 21 (S2) ◽  
pp. 137 ◽  
Author(s):  
Mikio Murozono ◽  
Sotoyuki Kitamura ◽  
Takuichi Ohmura ◽  
Kenji Kusao ◽  
Yoshiyuki Umeo

Nanomaterials ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 1003 ◽  
Author(s):  
Wen-Jeng Ho ◽  
Jheng-Jie Liu ◽  
Yun-Chieh Yang ◽  
Chun-Hung Ho

In this study, we sought to enhance the output power and conversion efficiency of textured silicon solar cells by layering two-dimensional indium nanoparticles (In NPs) within a double-layer (SiNx/SiO2) antireflective coating (ARC) to induce plasmonic forward scattering. The plasmonic effects were characterized using Raman scattering, absorbance spectra, optical reflectance, and external quantum efficiency. We compared the optical and electrical performance of cells with and without single layers and double layers of In NPs. The conversion efficiency of the cell with a double layer of In NPs (16.97%) was higher than that of the cell with a single layer of In NPs (16.61%) and greatly exceeded that of the cell without In NPs (16.16%). We also conducted a comprehensive study on the light-trapping performance of the textured silicon solar cells with and without layers of In NPs within the double layer of ARC at angles from 0° to 75°. The total electrical output power of cells under air mass (AM) 1.5 G illumination was calculated. The application of a double layer of In NPs enabled an impressive 53.42% improvement in electrical output power (compared to the cell without NPs) thanks to the effects of plasmonic forward scattering.


2009 ◽  
Vol 18 (5-8) ◽  
pp. 1028-1030 ◽  
Author(s):  
M.H. Oliveira ◽  
D.S. Silva ◽  
A.D.S. Côrtes ◽  
M.A.B. Namani ◽  
F.C. Marques

2012 ◽  
Vol 21 ◽  
pp. 89-94 ◽  
Author(s):  
Elena Manea ◽  
Catalin Corneliu Parvulescu ◽  
Munizer Purica ◽  
Elena Budianu ◽  
Florin Comanescu

This paper presents the preparation and characterization of nanostructured TiO2 films designated to the integration of antireflective (AR) layers into the fabrication process of the silicon solar cells. The nanostructured titanium dioxide (TiO2) layers have been obtained by the anodization of the Ti layer deposited by sputtering technique on glass substrates and silicon wafers. The obtained TiO2 films were optically characterized using the Spectroscopic Ellipsometry (SE) and the values of the refractive index are in a range of 1.66-1.76 at 632 nm radiation wavelength. The transmittance of 90 nm TiO2 thin films deposited on transparent substrate, evaluated by the spectrophotometry method, is over 70%. The TiO2 band gap of 3.3 eV was evaluated from the spectral transmittance characteristic. Silicon solar cells with various AR coatings of TiO2, SiO2 and SiO2 - TiO2 have been fabricated. The optoelectrical characterization proved that the output maximum power (Pmax) for the solar cell with a 90 nm TiO2 layer is with 28% greater than Pmax for the solar cells with SiO2 as AR layer and with 15.5 % greater than Pmax for the solar cells having a two-layer antireflective coating of SiO2 - TiO2.


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