Enhancement-mode AlGaN/GaN HEMTs with thin InGaN cap layer

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pp. 1929-1931 ◽  
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S. Kishimoto ◽  
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T. Mizutani
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Xintong Lyu ◽  
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...  

Author(s):  
A. Bellakhdar ◽  
A. Telia ◽  
J. L. Coutaz

We present an analytical model for the I-V characteristics of AlGaN/GaN and AlInN/GaN high electron mobility transistors (HEMT). Our study focuses on the influence of a GaN capping layer, and of thermal and self-heating effects. Spontaneous and piezoelectric polarizations at Al (Ga,In)N/GaN and GaN/Al(Ga,In)N interfaces have been incorporated in the analysis. Our model permits to fit several published data. Our results indicate that the GaN cap layer reduces the sheet density of the two-dimensional electron gas (2DEG), leading to a decrease of the drain current, and that n+-doped GaN cap layer provides a higher sheet density than undoped one. In n+GaN/AlInN/GaN HEMTs, the sheet carrier concentration is higher than in n+GaN/AlGaN/GaN HEMTs, due to the higher spontaneous polarization charge and conduction band discontinuity at the substrate/barrier layer interface.


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Qingyun Huang ◽  
...  

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