Comparative Study of the Stress in Chromium Films Deposited by Vacuum Arc Evaporation, Vacuum Evaporation, and DC Magnetron Sputtering

F. Elstner; C. Gautier; O. Piot; G. Contoux; F. Cosset; F. Nardou; J. Machet

doi:10.1002/pssa.2211540220

Comparative Study of the Stress in Chromium Films Deposited by Vacuum Arc Evaporation, Vacuum Evaporation, and DC Magnetron Sputtering

phys stat sol (a) ◽

10.1002/pssa.2211540220 ◽

1996 ◽

Vol 154 (2) ◽

pp. 669-679 ◽

Cited By ~ 9

Author(s):

F. Elstner ◽

C. Gautier ◽

O. Piot ◽

G. Contoux ◽

F. Cosset ◽

...

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Vacuum Evaporation ◽

Vacuum Arc ◽

Dc Magnetron Sputtering ◽

Chromium Films ◽

Arc Evaporation

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A Comparative Study of Structure and Residual Stress in Chromium Nitride Films Deposited by Vacuum Arc Evaporation, Ion Plating, and DC Magnetron Sputtering

phys stat sol (a) ◽

10.1002/pssa.2211580218 ◽

1996 ◽

Vol 158 (2) ◽

pp. 505-521 ◽

Cited By ~ 14

Author(s):

F. Elstner ◽

C. Gautier ◽

H. Moussaoui ◽

O. Piot ◽

J. Machet

Keyword(s):

Residual Stress ◽

Magnetron Sputtering ◽

Comparative Study ◽

Chromium Nitride ◽

Vacuum Arc ◽

Dc Magnetron Sputtering ◽

Ion Plating ◽

Arc Evaporation

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A comparative study of nanocrystalline Cu film deposited using anodic vacuum arc and dc magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.03.119 ◽

2011 ◽

Vol 205 (19) ◽

pp. 4582-4595 ◽

Cited By ~ 16

Author(s):

S.K. Mukherjee ◽

L. Joshi ◽

P.K. Barhai

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Vacuum Arc ◽

Dc Magnetron Sputtering ◽

Cu Film

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Comparative study of mechanical and structural properties of CrN films deposited by d.c. magnetron sputtering and vacuum arc evaporation

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)02951-9 ◽

1996 ◽

Vol 86-87 ◽

pp. 254-262 ◽

Cited By ~ 67

Author(s):

C. Gautier ◽

H. Moussaoui ◽

F. Elstner ◽

J. Machet

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Structural Properties ◽

Vacuum Arc ◽

Mechanical And Structural Properties ◽

Arc Evaporation

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Effects of deposition parameters on the texture of chromium films deposited by vacuum arc evaporation

Thin Solid Films ◽

10.1016/s0040-6090(96)08891-8 ◽

1996 ◽

Vol 289 (1-2) ◽

pp. 34-38 ◽

Cited By ~ 12

Author(s):

C Gautier ◽

J Machet

Keyword(s):

Vacuum Arc ◽

Deposition Parameters ◽

Chromium Films ◽

Arc Evaporation

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Comparative study of thin film physical properties for TiN x deposited by DC magnetron sputtering under temperatures less than 100°C on monocrystalline silicon and polycrystalline iron substrates

Thin Solid Films ◽

10.1016/s0040-6090(99)00460-5 ◽

1999 ◽

Vol 355-356 ◽

pp. 357-362 ◽

Cited By ~ 2

Author(s):

Ph. Roquiny ◽

A. Poulet ◽

Y. Leys ◽

J.-C. Descamps ◽

F. Bodart ◽

...

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Comparative Study ◽

Physical Properties ◽

Monocrystalline Silicon ◽

Dc Magnetron Sputtering ◽

Polycrystalline Iron

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$\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

IEEE Transactions on Plasma Science ◽

10.1109/tps.2010.2071885 ◽

2010 ◽

Vol 38 (11) ◽

pp. 3046-3056 ◽

Cited By ~ 53

Author(s):

Grzegorz Greczynski ◽

Jens Jensen ◽

Lars Hultman

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

High Power ◽

Dc Magnetron Sputtering ◽

Pulsed Magnetron

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Comparative study of anneal-induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00341-6 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 680-684 ◽

Cited By ~ 26

Author(s):

L.G. Jacobsohn ◽

R. Prioli ◽

F.L. Freire ◽

G. Mariotto ◽

M.M. Lacerda ◽

...

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Amorphous Carbon ◽

Argon Plasma ◽

Carbon Films ◽

Dc Magnetron Sputtering ◽

Amorphous Carbon Films

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Comparative study on early stages of film growth for transparent conductive oxide films deposited by dc magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2007.05.091 ◽

2008 ◽

Vol 516 (14) ◽

pp. 4598-4602 ◽

Cited By ~ 30

Author(s):

Yasushi Sato ◽

Mikihiro Taketomo ◽

Norihiro Ito ◽

Amica Miyamura ◽

Yuzo Shigesato

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Film Growth ◽

Oxide Films ◽

Transparent Conductive Oxide ◽

Dc Magnetron Sputtering ◽

Early Stages ◽

Conductive Oxide

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A comparative study of CrNx coatings Synthesized by dc and pulsed dc magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2008.09.093 ◽

2009 ◽

Vol 517 (6) ◽

pp. 1887-1894 ◽

Cited By ~ 68

Author(s):

J. Lin ◽

Z.L. Wu ◽

X.H. Zhang ◽

B. Mishra ◽

J.J. Moore ◽

...

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Dc Magnetron Sputtering ◽

Pulsed Dc ◽

Pulsed Dc Magnetron Sputtering

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Modelling of process formation of the nanocomposite TiN-Cu layers received by vacuum-arc evaporation of Ti and magnetron sputtering of Cu

Journal of Physics Conference Series ◽

10.1088/1742-6596/830/1/012091 ◽

2017 ◽

Vol 830 ◽

pp. 012091

Author(s):

D B-D Tsyrenov ◽

A P Semenov ◽

N N Smirnyagina

Keyword(s):

Magnetron Sputtering ◽

Vacuum Arc ◽

Process Formation ◽

Arc Evaporation

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