Effect of In/Zn Ratios on Resistive Switching Behavior of IZO/TiO 2 Thin Film Devices

2019 ◽  
Vol 216 (16) ◽  
pp. 1900018 ◽  
Author(s):  
Fei Shan ◽  
Sung‐Jin Kim
Materials ◽  
2020 ◽  
Vol 13 (12) ◽  
pp. 2755
Author(s):  
Tzu-Han Su ◽  
Ke-Jing Lee ◽  
Li-Wen Wang ◽  
Yu-Chi Chang ◽  
Yeong-Her Wang

To effectively improve the uniformity of switching behavior in resistive switching devices, this study developed magnesium zirconia nickel (MZN) nanorods grown on ITO electrodes through hydrothermal method. The field emission scanning electron microscope image shows the NR formation. Al/MZN NR/ITO structure exhibits forming-free and bipolar resistive switching behaviors. MZN NRs have relatively higher ON/OFF ratio and better uniformity compared with MZN thin film. The superior properties of MZN NRs can be attributed to its distinct geometry, which leads to the formation of straight and extensible conducting filaments along the direction of MZN NR. The results suggest the possibility of developing sol–gel NR-based resistive memory devices.


2020 ◽  
Vol 46 (13) ◽  
pp. 21196-21201 ◽  
Author(s):  
Hui-Chuan Liu ◽  
Xin-Gui Tang ◽  
Qiu-Xiang Liu ◽  
Yan-Ping Jiang ◽  
Wen-Hua Li ◽  
...  

2014 ◽  
Vol 9 (1) ◽  
pp. 3 ◽  
Author(s):  
Somnath Mondal ◽  
Jim-Long Her ◽  
Keiichi Koyama ◽  
Tung-Ming Pan

2014 ◽  
Vol 95 ◽  
pp. 96-99
Author(s):  
Yukiko Ogawa ◽  
Yuji Sutou ◽  
Daisuke Ando ◽  
Junichi Koike

The resistive switching behavior of a low resistive p-type α-Fe2O3 thin film sandwiched between Fe bottom electrode and top electrodes of various materials (Fe, Ni and TiN) was studied by current-voltage measurements. When TiN was used for top electrode of memory cell, the reversible resistive switching behavior was observed for over 100 cycles. From impedance measurement, it was suggested that the resistive switching behavior in the TiN/p-type α-Fe2O3/Fe device is attributed to the change of the contact resistance in the interface between TiN and α-Fe2O3 layers.


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