Impact of the AlN nucleation layer on the variation of the vertical-direction breakdown voltage of AlGaN/GaN high-electron-mobility transistor structures on a Si substrate
2017 ◽
Vol 214
(8)
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pp. 1600843
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2007 ◽
Vol 46
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pp. 2309-2311
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2004 ◽
Vol 43
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pp. 2239-2242
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2015 ◽
2008 ◽
Vol 47
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pp. 7069-7072
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Vol 5
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pp. 1035-1038