Microstructure and growth kinetics of nanocrystalline diamond films deposited in large area/low temperature distributed antenna array microwave-plasma reactor

2015 ◽  
Vol 212 (11) ◽  
pp. 2611-2615 ◽  
Author(s):  
Benoît Baudrillart ◽  
Fabien Bénédic ◽  
Ovidiu Brinza ◽  
Thomas Bieber ◽  
Thierry Chauveau ◽  
...  
Keyword(s):  
Low Temperature ◽  
Antenna Array ◽  
Growth Kinetics ◽  
Microwave Plasma ◽  
Plasma Reactor ◽  
Diamond Films ◽  
Nanocrystalline Diamond ◽  
Large Area ◽  
Nanocrystalline Diamond Films ◽  
Kinetics Of

Modelling of low-temperature/large-area distributed antenna array microwave-plasma reactor used for nanocrystalline diamond deposition

2018 ◽  
Vol 81 (1) ◽  
pp. 10804 ◽  
Author(s):  
Fabien Bénédic ◽  
Benoit Baudrillart ◽  
Jocelyn Achard
Keyword(s):  
Low Temperature ◽  
Antenna Array ◽  
Microwave Plasma ◽  
Plasma Reactor ◽  
Radial Profile ◽  
Chemical Vapor ◽  
Gas Temperature ◽  
Large Area ◽  
Microwave Source ◽  
Distributed Antenna

In this paper we investigate a distributed antenna array Plasma Enhanced Chemical Vapor Deposition system, composed of 16 microwave plasma sources arranged in a 2D matrix, which enables the growth of 4-in. diamond films at low pressure and low substrate temperature by using H2/CH4/CO2 gas chemistry. A self-consistent two-dimensional plasma model developed for hydrogen discharges is used to study the discharge behavior. Especially, the gas temperature is estimated close to 350 K at a position corresponding to the substrate location during the growth, which is suitable for low temperature deposition. Multi-source discharge modeling evidences that the uniformity of the plasma sheet formed by the individual plasmas ignited around each elementary microwave source strongly depends on the distance to the antennas. The radial profile of the film thickness homogeneity may be thus linked to the local variations of species density.

Study of Undoped Nanocrystalline Diamond Films Grown by Microwave Plasma-Assisted Chemical Vapor Deposition

2021 ◽  
Vol 55 (1) ◽  
pp. 66-75
Author(s):  
A. L. Vikharev ◽  
S. A. Bogdanov ◽  
N. M. Ovechkin ◽  
O. A. Ivanov ◽  
D. B. Radishev ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Nanocrystalline Diamond Films

Evaluation of Wear Rate of Nanocrystalline Diamond Films Using Abbott Curve

2017 ◽  
Vol 267 ◽  
pp. 185-189
Author(s):  
Andrei Bogatov ◽  
Vitali Podgursky
Keyword(s):  
Wear Rate ◽  
Cross Sections ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Nanocrystalline Diamond ◽  
Wear Rates ◽  
Nanocrystalline Diamond Films ◽  
Worn Surface

The nanocrystalline diamond films were deposited by microwave plasma enhanced chemical vapour deposition (PE-CVD) on Si (100) substrate. Reciprocating sliding tests were conducted using Si3N4 balls as a counter body. A method based on the construction of the Abbott curve representing the areas of pristine and worn surface in the wear scars was applied for estimation of the wear rate. The calculated wear rates were compared with the results obtained by profilometric measurements and direct measurement of the wear scars cross sections by scanning electron microscopy (SEM).

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