Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

2015 ◽  
Vol 212 (8) ◽  
pp. 1795-1799 ◽  
Author(s):  
Shuo Li ◽  
Yameng Bao ◽  
Mikko Laitinen ◽  
Timo Sajavaara ◽  
Matti Putkonen ◽  
...  
Keyword(s):  
Silicon Surface ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Silicon Surface Passivation

Silicon surface passivation using thin HfO2 films by atomic layer deposition

2015 ◽  
Vol 357 ◽  
pp. 635-642 ◽  
Author(s):  
Jhuma Gope ◽  
Vandana ◽  
Neha Batra ◽  
Jagannath Panigrahi ◽  
Rajbir Singh ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Silicon Surface Passivation

Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation

RSC Advances ◽  
2016 ◽  
Vol 6 (100) ◽  
pp. 97720-97727 ◽  
Author(s):  
Rajbir Singh ◽  
Vandana Vandana ◽  
Jagannath Panigrahi ◽  
P. K. Singh
Keyword(s):  
Hafnium Oxide ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Oxide Films ◽  
Atomic Layer ◽  
Silicon Surface Passivation

Plasma assisted ALD deposited hafnium oxide films are studied for silicon surface passivation. SRV < 40 cm s−1 are realized under optimised conditions.

The effect of light soaking on crystalline silicon surface passivation by atomic layer deposited Al2O3

2013 ◽  
Vol 113 (2) ◽  
pp. 024509 ◽  
Author(s):  
Baochen Liao ◽  
Rolf Stangl ◽  
Thomas Mueller ◽  
Fen Lin ◽  
Charanjit S. Bhatia ◽  
...  
Keyword(s):  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Atomic Layer ◽  
Silicon Surface Passivation ◽  
Effect Of Light
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