High rate amorphous and crystalline silicon formation by pulsed DC magnetron sputtering deposition for photovoltaics

2014 ◽  
Vol 212 (1) ◽  
pp. 42-46 ◽  
Author(s):  
Louise R. Bailey ◽  
Gary Proudfoot ◽  
Brodie Mackenzie ◽  
Niels Andersen ◽  
Arne Karlsson ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Crystalline Silicon ◽  
High Rate ◽  
Dc Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Crystalline silicon films grown by pulsed dc magnetron sputtering

2002 ◽  
Vol 299-302 ◽  
pp. 128-132 ◽  
Author(s):  
Peter Reinig ◽  
Frank Fenske ◽  
Walther Fuhs ◽  
Burkhardt Selle
Keyword(s):  
Magnetron Sputtering ◽  
Crystalline Silicon ◽  
Silicon Films ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Roll-to-roll pulsed dc magnetron sputtering deposition of WO3 for electrochromic windows

2001 ◽  
Vol 46 (13-14) ◽  
pp. 1931-1936 ◽  
Author(s):  
C. Brigouleix ◽  
P. Topart ◽  
E. Bruneton ◽  
F. Sabary ◽  
G. Nouhaut ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Sputtering Deposition ◽  
Roll To Roll ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering ◽  
Electrochromic Windows

scholarly journals Large area silicon epitaxy using pulsed DC magnetron sputtering deposition

2008 ◽  
Vol 85 (3) ◽  
pp. 636-639 ◽  
Author(s):  
P. Plantin ◽  
F. Challali ◽  
O. Carriot ◽  
F. Lainat ◽  
M. Ancilotti ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Large Area ◽  
Sputtering Deposition ◽  
Silicon Epitaxy ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

scholarly journals High rate deposition of thin film CdTe solar cells by pulsed dc magnetron sputtering

MRS Advances ◽  
2016 ◽  
Vol 1 (14) ◽  
pp. 917-922 ◽  
Author(s):  
P.M. Kaminski ◽  
A. Abbas ◽  
S. Yilmaz ◽  
J. W. Bowers ◽  
J.M. Walls
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Process Condition ◽  
Cadmium Sulphide ◽  
High Rate ◽  
Soda Lime Glass ◽  
Transparent Conductor ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

ABSTRACTA new high rate deposition method has been used to fabricate thin film CdTe photovoltaic devices using pulsed dc magnetron sputtering. The devices have been deposited in superstrate configuration on to a commercial fluorine doped tin oxide transparent conductor on soda lime glass. The cadmium sulphide and cadmium telluride thin films were deposited from compound targets. The magnetrons were mounted vertically around a cylindrical chamber and the substrate carrier rotates so that the layers can be deposited sequentially. The substrates were held at 200°C during deposition, a process condition previously found to minimize the stress in the coatings. Optimization of the process involved a number of parameters including control of pulse frequency, power and working gas pressure. The devices deposited using the process are exceptionally uniform enabling the CdTe absorber thickness to be reduced to ∼1um. The as-deposited material is dense and columnar. The cadmium chloride treatment increases the grain size and removes planar defects. The microstructure of the films before and after activation has been characterized using a number of techniques including transmission electron microscopy, Energy Dispersive mapping and these measurements have been correlated to device performance. The deposition rate is much higher than can be obtained with radio-frequency sputtering and is comparable with methods currently used in thin film CdTe module manufacturing such as Vapour Transport Deposition and Close Space Sublimation.

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